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Thermal Expansion Mismatch in Electronic Packaging

Published online by Cambridge University Press:  22 February 2011

R. O. Carlson
Affiliation:
General Electric Company Corporate Research & Development Schenectady, New York 12301
H. H. Glascock II
Affiliation:
General Electric Company Corporate Research & Development Schenectady, New York 12301
H. F. Webster
Affiliation:
General Electric Company Corporate Research & Development Schenectady, New York 12301
C. A. Neugebauer
Affiliation:
General Electric Company Corporate Research & Development Schenectady, New York 12301
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Abstract

Thermal expansion mismatch causes serious problems in operating device reliability because of the various stresses imposed on the joint materials undergoing temperature changes. Silicon has a low expansion coefficient so strain buffers are often employed between the silicon and the outer metal covers with relatively high expansion coefficients. These buffers can be metals like molybdenum, ceramics like alumina, or a brush structure of copper, with soft solders at the joints. However, solders themselves have finite fatigue lives which can be estimated from material and dimensional data.

Type
Research Article
Copyright
Copyright © Materials Research Society 1985

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References

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