Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Allan, N L
Lawton, J M
and
Mackrodt, W C
1989.
Calculated crystal and defect properties of ternary cuprates M2CuO3(M identical to Ca, Sr): relationship to La2CuO4and high-Tcsuperconductivity.
Journal of Physics: Condensed Matter,
Vol. 1,
Issue. 16,
p.
2657.
Chen, Y. L.
Mantese, J. V.
Hamdi, A. H.
and
Micheli, A. L.
1989.
Microstructure and superconducting properties of Y–Ba–Cu–O and Yb–Ba–Cu–O thin films formed by metalorganic deposition.
Journal of Materials Research,
Vol. 4,
Issue. 5,
p.
1065.
Allan, N. L.
and
Mackrodt, W. C.
1989.
Atomistic lattice simulation of high Tc oxides.
Journal of Computer-Aided Molecular Design,
Vol. 3,
Issue. 4,
p.
299.
Allan, N L
Kenway, P
Mackrodt, W C
and
Parker, S C
1989.
Calculated surface properties of La2CuO4: implications for high-Tcbehavior.
Journal of Physics: Condensed Matter,
Vol. 1,
Issue. SB,
p.
SB119.
Mackrodt, W C
1989.
Calculated lattice structure, stability and properties of the series Bi2X2CuO6(X=Ca, Sr, Ba), Bi2X2YCu2O8(X=Ca, Sr, Ba; Y=Mg, Ca, Sr, Ba) and Bi2X2Y2Cu3O10(X=Ca, Sr, Ba; Y=Ba, Sr, Ca, Mg).
Superconductor Science and Technology,
Vol. 1,
Issue. 6,
p.
343.
Skrehot, Michael K.
and
Chang, Kai
1990.
Analysis and modeling of a high-temperature superconducting floating resonant strip in waveguide.
International Journal of Infrared and Millimeter Waves,
Vol. 11,
Issue. 12,
p.
1355.
Skrehot, M.K.
and
Chang, K.
1990.
A new resistance measurement technique applicable to high-temperature superconducting materials at microwave frequencies.
IEEE Transactions on Microwave Theory and Techniques,
Vol. 38,
Issue. 4,
p.
434.
Sawan, Y
and
Shaikh, A M
1991.
Zero resistance states in modified Y-Ba-Cu-O system with transition temperatures above 135 K.
Bulletin of Materials Science,
Vol. 14,
Issue. 2,
p.
339.
Takahashi, N.
Koukitu, A.
and
Seki, H.
1996.
Preparation and characterization of Y-system superconducting thin films by mist microwave-plasma chemical vapour deposition.
Journal of Materials Science,
Vol. 31,
Issue. 11,
p.
2897.