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A Theoretical Model for Steam Laser Cleaning

Published online by Cambridge University Press:  15 February 2011

Y. F. Lu ,
Y. Zhang ,
W. D. Song  and
T. S. Low
Y. F. Lu
Affiliation:
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260
Y. Zhang
Affiliation:
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260
W. D. Song
Affiliation:
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260
T. S. Low
Affiliation:
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260
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Abstract

A theoretical model for removal of tiny particles from solid surface covered with a thin liquid film by laser cleaning is established by taking adhesion force and cleaning force into account. When pulsed laser irradiates on the solid surface coated with a thin liquid film, a sheet of liquid near the liquid/substrate interface can be superheated through thermal diffusion. The rapid growth of vapor bubbles inside the superheated liquid can generate transient stress wave with high pressure, large enough to expel micron and sub-micron particles from the contaminated surface. By calculating the adhesion force and cleaning force, the cleaning threshold of laser fluence can be predicted from this theoretical model. The difference between cleaning force and adhesion force increases quickly along with the laser fluence and leads to higher cleaning efficiency.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 526: Symposium Y – Advances in Laser Ablation of Materials , 1998 , 409
Copyright
Copyright © Materials Research Society 1998

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