Hostname: page-component-78c5997874-4rdpn Total loading time: 0 Render date: 2024-11-09T08:28:41.077Z Has data issue: false hasContentIssue false

Texture of Gold-Palladium Couples

Published online by Cambridge University Press:  10 February 2011

Young S. Chung
Affiliation:
Motorola, 5005 E. McDowell Rd., MD=P004, Phoenix, AZ 85008
Keenan Evans
Affiliation:
Motorola, 5005 E. McDowell Rd., MD=P004, Phoenix, AZ 85008
William Glaunsinger
Affiliation:
Department of Chemistry and Biochemistry, Arizona State University, Tempe, AZ 85287
Get access

Abstract

The crystal textures of polycrystalline films of gold-palladium couples on an oxidized silicon (100) substrates were investigated via x-ray diffraction (XRD) pole figures. Studies were performed on both as-deposited and thermally annealed films. Scanning electron microscopy (SEM) was used to examine the microstructures of the seed layer thin films as deposited. The {111} texture formation of gold-palladium thin film couples displayed a strong dependence on the nature of the underlying seed layer. Gold films deposited on a palladium seed layer revealed much less degree of {111} texture, than gold films deposited directly on a silicon dioxide surface. In contrast, palladium films deposited on polycrystalline gold films showed a higher degree of {111} texture, compared to palladium films deposited directly on silicon dioxide. The {111} texture of annealed gold-palladium alloy thin films was greater for palladium on gold than for gold on palladium. These results are interpreted in terms of the gold-palladium diffusion mechanism and the interaction of the condensing metals with the oxygens of the SiO2 substrate surface.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Evans, D.M. and Wilman, H., Acta Crystallogr., 5, 731 (1952).Google Scholar
2. Kakati, K.K. and Wilman, H., J. Phys. D, 6, 1307 (1973).Google Scholar
Kakati, K.K. and Wilman, H., J. Phys. D, 13 (1980).Google Scholar
3. George, M. and Glaunsinger, W., Thin Solid films, 245, 215 (1994)Google Scholar
4. Chidsey, C.E.D., Loiacono, D.N., Sleator, T., and Nakahara, S., Surf. Sci. 200, 45 (1988).Google Scholar
5. Vencea, J., Reiss, G., Schnieder, F., Bauer, K., and Hoffman, H., Surf. Sci. 218, 108 (1989).Google Scholar
6. Poppa, H., Heinemann, K., and Elliot, A.G., JVST, 8, 471 (1970).Google Scholar
7. Reichelt, K. and Rutz, O.H., J. Crystal Growth, 10, 103 (1971).Google Scholar
8. Norrman, S., Andersson, T., Peteo, G. and Somogyi, S., Thin Solid films, 77, 359 (1981).Google Scholar
9. Chung, Y.S., Evans, K., and Glaunsinger, W., Thin Solid films, submitted (1997).Google Scholar
10. Kubaschewski, O. and Corniseli, J.F., Monach. Chem. 102, 1724 (1971).Google Scholar
11. Poate, J.M., Turner, P.A., and DeBonte, W.J., J. Appl. Phys. 46, 4275 (1975).Google Scholar