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Published online by Cambridge University Press: 21 February 2011
GaAs pin and nip diodes have been grown by Atomic Layer Molecular Beam Epitaxy at 350°C on p-type and n-type (001 ) Si substrates respectively. These devices present different electrical characteristics. TEM characterization of these structures shows an asymmetric planar defect distribution whose orientation depends on the type of doping introduced in the GaAs layer immediately grown on the Si substrate. These results can be explained taking into account that the dissociation of dislocations depends both on the polarity of the dislocation and the doping type of the epilayer.