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Synthesis of Vertically Aligned Carbon Nanofiber Films by RF Magnetron Sputtering

Published online by Cambridge University Press:  21 March 2011

K. -Y. Lee
Affiliation:
Department of Electronic Engineering, Faculty of Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565–0871, Japan
K. Fujimoto
Affiliation:
Department of Electronic Engineering, Faculty of Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565–0871, Japan
S. Ohkura
Affiliation:
Department of Electronic Engineering, Faculty of Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565–0871, Japan
S. Honda
Affiliation:
Department of Electronic Engineering, Faculty of Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565–0871, Japan
M. Katayama
Affiliation:
Department of Electronic Engineering, Faculty of Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565–0871, Japan
T. Hirao
Affiliation:
Department of Electrical Engineering, Faculty of Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565–0871, Japan
K. Oura
Affiliation:
Department of Electronic Engineering, Faculty of Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565–0871, Japan
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Abstract

The aligned carbon nanofibers were synthesized on Si substrates using RF magnetron sputtering with a hot filament. The hot filament was made of tungsten wire and its temperature was up to 2000°C during the deposition. Nitrogen was used as the sputter gas at a relatively low pressure of 2×10-2 Torr. The sputtering deposition was carried out at a substrate temperature of 700°C. The nanofibers were grown vertically on the substrates. The diameters and the density of the fibers were about 30–45 nm and 109 cm-2, respectively.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

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