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Synthesis of B-C-N Thin Films by Ion-Beam-Assisted Deposition and Their Mechanical Properties

Published online by Cambridge University Press:  17 March 2011

Akihito Matsumuro ,
Yoshimasa Kato  and
Hidenobu Ohta
Akihito Matsumuro
Affiliation:
Department of Micro system Engineering, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan
Yoshimasa Kato
Affiliation:
Department of Micro system Engineering, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan
Hidenobu Ohta
Affiliation:
Department of Micro system Engineering, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan
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Abstract

B-C-N films have been synthesized by an ion-beam-assisted deposition technique, in which boron and carbon were evaporated by electron beam and a mixed nitrogen and argon ion beam was simulataneously irradiated onto silicon (100) substrates. The ratio of argon ions to nitrogen ions was varied by the flow rate ratio of Ar and N2 gases fed into the ion source. In this experiment, the influence of the ratio on the mechanical properties and the microstructure were investigated. Nano indentation studies show the maximum hardness up to 23 GPa at the gas ratio of 25.50 %. The films prepared under the appropriate conditions indicated low friction coefficients of 0.04-0.08 against a sapphire ball and excellent wear resistance. The existence of a cubic B-C-N like phase in the film, which has been predicted as one of new hard materials, was revealed by various micro-structural analyses. It was concluded that the excellent mechanical properties prepared at the optimum gas ratio could be attributed to the appearnce of the new cubic like phase.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 647: Symposium O – Ion Beam Synthesis & Processing of Advanced Materials , 2000 , O11.5
Copyright
Copyright © Materials Research Society 2001

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References

1. Popov, C., Saito, K., Yamamoto, A., Ouchi, A., Nakamura, T., Ohana, Y. and Koga, Y., J. Mater. Sci. 53,1281(1998).Google Scholar
2. Ren, Z., Du, Y., Ying, Z., Li, F., Lin, J., Ren, Y. and Zong, X, Mater. Chem. Phys. 50,98(1997).Google Scholar
3. Watanabe, M. O., Itoh, S. and Mizushima, K., Appl. Phys. Lett. 68,2962(1996).Google Scholar
4. Derre, A., Filipozzi, L., Bouyer, F. and Marchand, A., J. Mater. Sci. 29, 1589(1994).Google Scholar
5. Kohazaki, M., Matsumuro, A., Hayashi, T., Muramatsu, M. and Yamaguchi, K., Thin Solid Films 308–309, 239(1997).Google Scholar
6. Mirkarimi, P. B., McCarty, K. F., Medlin, D. L., Wolfer, W. G., Friedmann, T. A., Klaus, E. J., Cardinale, G. F. and Howitt, D. G., J. Mater. Res., 9, 2925(1994).Google Scholar
7. McChlune, W. F., Powder Diffraction File Release 1999, (International Center for Diffraction Data, Pennsylvania, 1999).Google Scholar
8. Polo, M. C., Martinez, E., Esteve, J. and Andjar, J. L., Diamond and Related Materials 8,423(1999).Google Scholar
9. Hayashi, T., Matsumuro, A., Muramatsu, M., Kohzaki, M. and Yamaguchi, K., Thin Solid Films (2000), in press.Google Scholar