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Synthesis and Characterization of Small Grain Sized Molybdenum Nitride Films

Published online by Cambridge University Press:  10 February 2011

S. L. Roberson
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Box 7907 Raleigh, NC 27695–7907
D. Finello
Affiliation:
U.S. Air Force Palace Knight student attending, North Carolina State University
R. F. Davis
Affiliation:
U.S. Air Force, WL/MNMF, Eglin AFB, FL 32542
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Abstract

Polycrystalline, small grain sized, 15 μm thick MoxN (x=1 or 2) films, void of detectable concentrations of molybdenum oxides, have been prepared on 50 μm thick nitrided Ti substrates via conversion of precursor MoO3 films in a programmed reaction with NH3. The latter films were produced via liquid spray pyrolysis of an MoCl5/methanol mixture in air at 500° C. The reaction of MoO3 films with NH3 resulted in a two-phase MoxN mixture consisting of γ-Mo2N and δ-MoN. The change in density of MoO3(ρ=4.69 g/cm3) to γ-MoN (ρ=9.50 g/cm3) and δ-MoN (ρ=9.05 g/cm3) produced grains with a calculated average size of 10 nm without losing adherence to the substrate. The composition of the MoxN films was determined by X-ray diffraction (XRD) and Auger electron spectroscopy (AES) to be ∼ 60% γ-Mo2N and 40% δ-MoN. The results of scanning electron microscopy (SEM) showed the surface morphology of the MoxN films to be highly porous.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

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