Hostname: page-component-586b7cd67f-dlnhk Total loading time: 0 Render date: 2024-11-29T13:06:54.345Z Has data issue: false hasContentIssue false
  • English
  • Français

Synthesis and Characterization of Nanocrystalline Diamond and Its Biomedical Application

Published online by Cambridge University Press:  01 February 2011

Zhenqing Xu ,
Arun Kumar ,
Ashok Kumar  and
Arun Sikder
Zhenqing Xu
Affiliation:
Department of Mechanical Engineering, University of South Florida, Tampa, FL, 33620, USA Nanomaterials and Nanomanufacturing Research Center, University of South Florida, Tampa, FL, 33620, USA
Arun Kumar
Affiliation:
Nanomaterials and Nanomanufacturing Research Center, University of South Florida, Tampa, FL, 33620, USA
Ashok Kumar
Affiliation:
Department of Mechanical Engineering, University of South Florida, Tampa, FL, 33620, USA Nanomaterials and Nanomanufacturing Research Center, University of South Florida, Tampa, FL, 33620, USA
Arun Sikder
Affiliation:
Nanomaterials and Nanomanufacturing Research Center, University of South Florida, Tampa, FL, 33620, USA
Get access

Abstract

Diamond is known as the material that has excellent mechanical, electrical and chemical properties. Diamond is also an ideal interface that is compatible with microelectronics process and biological environments to work as a biosensor platform with excellent selectivity and stability. In our study, nanocrystalline diamond (NCD) films were grown on Si substrates by the microwave plasma enhanced chemical vapor deposition (MPECVD) method. Parameters such as gas composition, temperature and pressure are investigated to get the best film quality. Scanning electron microscopy (SEM) and Raman spectroscopy were used to characterize the NCD films. Then the NCD films were treated by hydrogen plasma in the CVD chamber to obtain the hydrogen terminated surface. This hydrogenated NCD film is ready for bio-modification and can work as the platform of the biosensors. Fourier Transform Infrared Spectroscopy (FTIR) and X-ray Photoelectron Spectroscopy (XPS) were employed to confirm the surface hydrogenation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 843: Symposium T – Surface Engineering-Fundamentals and Applications , 2004 , T2.8
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Yoshikawa, H., Morel, C., Koga, Y., Diam. Relat. Mater. 10, 1588 (2001)Google Scholar
2. Sharda, T., Soga, T., Jimbo, T., Umeno, M., Diam. Relat. Mater. 10, 1592 (2001)Google Scholar
3. Wang, T., Xin, H.W., Zhang, Z.M., Dai, Y.B., Shen, H.S., Diam. Relat. Mater. 13, 6 (2004)Google Scholar
4. Qiu, D.J., Feng, A.M., Wu, H.Z., Diam. Relat. Mater. 13, 419 (2004)Google Scholar
5. Weide, J., Zhang, Z., Baumann, P.K., Phys. Rev. B 50 5803 (1994)Google Scholar
6. Krainsky, I.L., Asnin, V.M., Apply. Phys. Lett. 72 2574 (1998)Google Scholar
7. Davidson, J.L., Kang, W.P., Wisitsora-At, A., Diam. Relat. Mater. 12 429 (2003)Google Scholar
8. Aleksov, A., Kubovic, M., Kasu, M., Schmid, P., Grobe, D., Ertl, S., Schreck, M., Strizker, B., Kohn, E., Diam. Relat. Mater. 13 233 (2004)Google Scholar
9. Deuerler, F., Lemmer, O., Frank, M., Pohl, M., Hebing, C., Int. J. of Refractory Mater. and Hard Mater. 20 115 (2002)Google Scholar
10. Bower, C., Zhu, W., Jin, S., Zhou, O., Appl. Phys. Lett. 77 830 (2000)Google Scholar
11. Gruen Dieter, M., Nanocrystalline diamond films, Annu. Rev. Mater. Sci. 29 211 (1999)Google Scholar
12. Yoshikawa, H., Morel, C., Koga, Y., Diam. Relat. Mater. 10 1588 (2001)Google Scholar
13. Thoms, B.D., Owens, M.S., Butler, J.E., Spiro, C., Appl. Phys. Let. 65, 2957 (1994)Google Scholar
14. Birrell, J., Gerbi, J.E., Auciello, O., Gibson, J.M., Johnson, J., Carlisle, J.A., Diam. Relat. Mater. 14 1588 (2004)Google Scholar
15. Bhattacharyya, S., Auciello, O., Birrell, J., Carlisle, J.A., Curtiss, L.A., Goyette, A.N., Gruen, D.M., Krauss, A.R., Schlueter, J., Sumant, A., Zapol, P., Appl. Phys. Let. 79, 1441 (2001)Google Scholar
16. Maier, F., Graupner, R., Hollering, M., Hammer, L., Ristein, J., Ley, L., Surface Sci. 443, 177 (1999)Google Scholar
17. Zhang, Q., Yoon, S. F., Rusli, , Yang, H., Ahn, J., J. Appl. Phys. 83 (3), 1349 (1998)Google Scholar