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Synchrotron x-Ray Topographic Study Of Dislocations In Gaas Detector Crystals Grown By Vertical Gradient Freeze Technique

Published online by Cambridge University Press:  10 February 2011

T. Tuomi
Affiliation:
Optoclectronics Laboratory, Helsinki University of Technology, P.O. Box 3000, FIN-02015 Hut, Finland
M. Juvonen
Affiliation:
Optoclectronics Laboratory, Helsinki University of Technology, P.O. Box 3000, FIN-02015 Hut, Finland
R. Rantamäki
Affiliation:
Optoclectronics Laboratory, Helsinki University of Technology, P.O. Box 3000, FIN-02015 Hut, Finland
K. Hjelt
Affiliation:
Optoclectronics Laboratory, Helsinki University of Technology, P.O. Box 3000, FIN-02015 Hut, Finland
M. Bavdaz
Affiliation:
Space Science Department, European Space Agency, P.O. Box 229, NL-2200AG Noordwiijk, The Netherlands
S. Nenonen
Affiliation:
Metorex International Oy, P.O. Box 85, FIN-02631 Espoo, FINLAND
M -A. Gagliardi
Affiliation:
Metorex International Oy, P.O. Box 85, FIN-02631 Espoo, FINLAND
P. J. Mcnally
Affiliation:
Microelectronics Research Laboratory, Dublin City University, Dublin 9, IRELAND
A. N. Danilewsky
Affiliation:
Kristallographisches Institut, Universität Freiburg, D-79104 Freiburg, GERMANY
E. Prieur
Affiliation:
Okmetic Ltd., P.O. Box 44, FIN-02631 Espoo, FINLAND
M. Taskinen
Affiliation:
Okmetic Ltd., P.O. Box 44, FIN-02631 Espoo, FINLAND
M. Tuominen
Affiliation:
Okmetic Ltd., P.O. Box 44, FIN-02631 Espoo, FINLAND
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Abstract

Large area transmission and section topographs of semi-insulating gallium arsenide wafers grown by the gradient freeze technique are made with synchrotron radiation at HASYLAB in Hamburg and at ESRF in Grenoble. Several high-resolution images including stereo pairs are obtained on the same film at a time. A typical dislocation line is an arc of a circle which starts from one surface and ends at the same surface. From the disappearance of the dislocation image and using the g · b = 0 criterion it is concluded that the Burgers vector b of the most common dislocations is parallel to 〈110〉. Rather large volumes of the wafer are dislocation-free. Section topographs of epitaxial wafers show defects and strain fields at the interface between an n-type substrate and the epitaxial layers grown by chemical vapor deposition. The results are compared with those obtained from detector performance measurements.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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References

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