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Surface Reactions Leading to Contamination of Metal Films Photochemically Deposited from the Hexacarbonyls

Published online by Cambridge University Press:  25 February 2011

K. A. Singmaster ,
F. A. Houle  and
R. J. Wilson
K. A. Singmaster
Affiliation:
IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, CA 95120
F. A. Houle
Affiliation:
IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, CA 95120
R. J. Wilson
Affiliation:
IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, CA 95120
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Abstract

A systematic study of the origin of contaminants in metal films photochemically deposited from the group VI hexacarbonyls is described. Background gas present in the cell during deposition, exposure to air and incomplctc removal of CO groups from the surface of the growing film all affect C and O incorporation. The data are compared to results of recent experiments examining surface photoproducts of the metal carbonyls.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 131: Symposium E – Chemical Perspectives of Microelectronic Materials I , 1988 , 469
Copyright
Copyright © Materials Research Society 1989

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References

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