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Surface Reactions in Discharge and Cvd Deposition of Silane

Published online by Cambridge University Press:  28 February 2011

Alan Gallagher
Alan Gallagher*
Affiliation:
Joint Institute for Laboratory Astrophysics, University of Colorado and National Bureau of Standards, Boulder, Colorado 80309-0440
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Abstract

Glow discharge deposition of hydrogenated amorphous silicon films involves; (A) the electron collisions which produce the reactive species, (B) the gas reactions these species undergo while diffusing or drifting to the surfaces, and (C) the surface reactions involved in film growth and gas processing. I will first describe our knowledge of the electron and gas reactions in these discharges, then of the surface reactions, and finally I will offer some conjectures regarding the influence of these different surface reactions and bombardments upon film properties.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 70: Symposium E – Materials Issues in Amorphous-Semiconductor Technology , 1986 , 3
Copyright
Copyright © Materials Research Society 1986

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References

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