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Surface engineering of SrTiO3 (111) substrates for the epitaxial growth of BLT films

Published online by Cambridge University Press:  01 February 2011

Ju Hyung Suh
Affiliation:
Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 790–784, Korea
Yong Seok Lee
Affiliation:
Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 790–784, Korea
Chan-Gyung Park
Affiliation:
Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 790–784, Korea
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Abstract

The optimized surface termination of SrTiO3 (111) substrates was investigated and the effects of the terminated SrTiO3 (111) substrate on the growth characteristics of epitaxial Bi4−xLaxTi3O12 (BLT) films were evaluated. It was found that etching in buffered HF (BOE) solution for 2min provides a stable etching condition for SrTiO3 (111) substrates and that etching is an important factor for the formation of terrace structures. The microstructure of BLT films grown on the terminated substrate revealed a flat surface morphology and well-defined interfacial structure in comparison with BLT films grown on non-terminated substrate. Therefore, surface termination is a crucial factor for determining the quality of film morphology and interfacial structure.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

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References

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