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Surface Chemical Studies of Oxides and Nitrides

Published online by Cambridge University Press:  22 February 2011

Carlo G. Pantano
Carlo G. Pantano*
Affiliation:
Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA 16802
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Abstract

The application of surface analysis techniques for the study of fundamental surface and thin film phenomena is described. The topics covered relate to the processing and fabrication of electronic packages and include: evaporation/condensation during the thermal processing of glasses, hydration of glass surfaces and thin films, nitridation of silica films, diffusion behavior in oxides at low temperature, and impurity segregation in thin films. A wide variety of surface analytical methods are exemplified including Auger electron spectroscopy (AES), ion-scattering spectroscopy (ISS), nuclear reaction analysis (NRA), secondary-ion mass spectroscopy (SIMS) and x-ray photoelectron spectroscopy (XPS).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 40: Symposium J – Electronic Packaging Materials Science I , 1984 , 303
Copyright
Copyright © Materials Research Society 1985

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References

1. Czanderna, A. W., Editor, Methods of Surface Analysis (Elsevier 1975).Google Scholar
2. Thomas, J. P. and Cachard, A., Editors, Material Characterization Using Ion Beams (Plenum, 1978).Google Scholar
3. Sundahl, R. C., Relationship Between Substrate Surface Chemistry and Adhesion of Thin Films, J. Vac. Sci. Technol., 9, 181 (1972).CrossRefGoogle Scholar
4. Holloway, P. H., Application of Surface Analysis for Electronic Devices, ASTM STP 699, 5 (1980).Google Scholar
5. Dettmer, E. S., et al, Epoxy Characterization and Testing Using Mechanical, Electrical and Surface Analysis Techniques, Int. J. Hybrid Microelectronics, 6, 375 (1983).Google Scholar
6. Pantano, C. G., Surface and In-Depth Analysis of Glass and Ceramics, Am. Ceram. Soc. Bull., 60, 1154 (1981).Google Scholar
7. Kelso, J. F. and Pantano, C. G., Spectroscopic Examination of Clean Glass Surfaces at Elevated Temperature, to appear J. Vac. Sci. Technol., 1985.Google Scholar
8. Lanford, W. A., et al., Nuclear Reaction Analysis of Glass Surfaces, Materials Science Research, 15, 549 (1983).Google Scholar
9. Magee, C. W. and Botnick, E. M., Hydrogen Depth Profiling Using SIMS - Problems and Their Solutions, J. Vac. Sci. Technol., 19, 47 (1981).CrossRefGoogle Scholar
10. Colombin, L., et al., Penetration of Tin in the Bottom Surface of Float Glass: A Snythesis, J. Non-Cryst. Sol., 38, 551 (1980).CrossRefGoogle Scholar
11. Suscavage, M. J. and Pantano, C. G., Tin Penetration into a Soda-Lime-Magnesia-Silica Glass, Glass Techn. Ber., 56K, 498 (1983).Google Scholar
12. Shelby, J. E., Vitko, J. and Pantano, C. G., Weathering of Glasses for Solar Applications, Solar Energy Mat., 3, 97 (1980).Google Scholar
13. Tummala, R. R. and Foster, B. J., Strength and Dynamic Fatigue of Float Glass Surfaces, J. Am. Ceram. Soc., 58, 156 (1975).Google Scholar
14. Monkowksi, J., Role of Chlorine in Silicon Oxidation, Solid State Techn. 58 (July 1979), 113 (Aug 1979).Google Scholar
15. Koba, R., et al., Hygroscopic Behavior of SiO2 and SixOyCl2 Thins Film on Si Using ATR-FTIR, to appear in Mat. Sci. Research 1985.Google Scholar
16. Kapoor, V. J. and Stein, H. J., Editors, Silicon Nitride Thin Insulating Films, Proceedings Volume 83–8 of the Electrochemical Society, 1983.Google Scholar
17. Ito, T., et al., Direct Thermal Nitridation of Silicon Dioxide Films in Anhydrous Ammonia Gas, J. Electrochem. Soc., 127, 2053 (1980).CrossRefGoogle Scholar
18. Nemetz, J. A. and Tressler, R. E., Thermal Nitridation of Silicon and Silicon Dioxide for Thin Gate Insulators, Solid State Techn., 79 (February 1983), 209 (September 1983).Google Scholar
19. Pantano, C. G., Glaser, P. M. and Armbrust, D. H., Nitridation of Silica Sol/Gel Thin Films in Ultrastructure Processing of Ceramics, Glasses and Composites, (John Wiley, New York, 1983).Google Scholar
20. Brow, R. K. and Pantano, C. G., Composition and Chemical Structure of Nitrided Silica Gel, in Better Ceramics Through Chemistry (Elsevier, 1984).Google Scholar
21. Raider, S. I., et al, Surface Oxidation of Silicon Nitride Films, J. Electrochem. Soc., 123, 560 (1976).Google Scholar
22. Jen, J. S., The Adsorption of γ-NH2 (CH2)3 Si(OC2H5)3 on Glass Surfaces, Cer. Eng. Sci. Proc., 3, 450 (1982).Google Scholar
23. Cygan, R. T., Chemical Diffusion and Dielectric Polarization Processes in Silicate Minerals, Ph. D. Thesis, The Pennsylvania State University, 1983.Google Scholar
24. Freer, R., Diffusion in Silicate Minerals and Glasses, Contributions to Mineralogy and Petrology, 76, 440 (1981).CrossRefGoogle Scholar
25. U. S. PatentGoogle Scholar
26. Schmid, R. S. and Pantano, C. G., Titanium Impurity Effects in Thin Film Oxide Cathodes, to appear in Appl. Surf. Sci., 1985.Google Scholar