Hostname: page-component-cd9895bd7-gxg78 Total loading time: 0 Render date: 2024-12-27T02:07:25.026Z Has data issue: false hasContentIssue false

Surface Characterization of GaN Formation on GaAs(100) Using Ammonia

Published online by Cambridge University Press:  10 February 2011

Chul Huh
Affiliation:
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology, Kwangju 506-712, Korea
Sook Ahn
Affiliation:
Department of Physics, Jeonbuk National University, Jeonju 561-756, Korea
Jeong Yeul Han
Affiliation:
Department of Physics, Jeonbuk National University, Jeonju 561-756, Korea
Keum Jae Cho
Affiliation:
Department of Physics, Jeonbuk National University, Jeonju 561-756, Korea
Jae Myung Seo
Affiliation:
Department of Physics, Jeonbuk National University, Jeonju 561-756, Korea
Seong-Ju Park
Affiliation:
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology, Kwangju 506-712, Korea
Get access

Abstract

The GaN formation on GaAs(100) using NH3 has been investigated using synchrotron radiation photoemission spectroscopy and an atomic force microscope (AFM). This study showed the effect of nitridation temperature on the compositional change, the chemical states, and the surface morphological changes in the nitridated surface layer. It was observed that ammonia is decomposed to an activated nitrogen atom above 700°C forming GaN on the surface. A thermally nitridated layer was composed of metallic Ga and GaN islands elongated along the [011] direction to relax the tensile strain in the [011] direction. As the nitridation temperature increased, the composition of GaN increased in the nitridated layer due to the efficient thermal decomposition of NH3 and the subsequent incorporation of the N atom to the metallic Ga. The surface morphology of the nitridated layer was also sensitive to the nitridation temperature and a smooth surface morphology could be obtained on the surface nitridated at 700°C.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Sun, Y. M., and Ekerdt, J. G., J. Vac. Sci. Technol. B 11, 610 (1993).Google Scholar
2. Uwai, K., Yamauchi, Y., and Kobayashi, N., Appl. Surf. Sci. 100/101, 412 (1996).Google Scholar
3. Kuwano, N., Nagatomo, Y., Kobayashi, K., Oki, K., Miyoshi, S., Yaguchi, H., Onabe, K., and Shiraki, Y., Jpn. J. Appl. Phys. 33, 18 (1994).Google Scholar
4. Hauenstein, R. J., Collins, D. A., Cai, X. P., O'Steen, M. L., and Mcgill, T. C., Appl. Phys. Lett. 66, 2861 (1995).Google Scholar
5. Zhu, X. Y., Wolf, M., and White, J. M., J. Vac. Sci. Technol. A 11, 838 (1993).Google Scholar
6. Jones, M. E., Shealy, J. R., and Engstrom, J. R., Appl. Phys. Lett. 67, 542 (1995).Google Scholar
7. Delouise, L. A., J. Vac. Sci. Technol. A 10, 1637 (1992).Google Scholar
8. Ruckman, M. W., Cao, J., Park, K. T., Gao, Y., and Wicks, G. W., Appl. Phys. Lett. 59, 849 (1991).Google Scholar
9. Yang, Z., Li, L. K., and Wang, W. I., Appl. Phys. Lett. 67, 1686 (1995).Google Scholar
10. Jian, Ma, Garni, B., Perkins, N., O'Brien, W. L., Kuech, T. F., and Lagally, M. G., Appl. Phys. Lett. 69, 3351 (1996).Google Scholar
11. Masuda, A., Yonezawa, Y., Morimoto, A., and Shimizu, T., Jpn. J. Appl. Phys. 34,1075 (1995).Google Scholar