Hostname: page-component-cd9895bd7-gvvz8 Total loading time: 0 Render date: 2024-12-27T02:01:31.978Z Has data issue: false hasContentIssue false

Suppression of Bulk Defects in Antimonide Superlattice Infrared Photodiodes

Published online by Cambridge University Press:  01 February 2011

E. H. Aifer
Affiliation:
Naval Research Laboratory, Washington, DC 20375-5347, U.S.A.
E. M. Jackson
Affiliation:
SFA Inc., Largo, MD 20774, U.S.A.
B. R. Bennett
Affiliation:
Naval Research Laboratory, Washington, DC 20375-5347, U.S.A.
I. Vurgaftman
Affiliation:
Naval Research Laboratory, Washington, DC 20375-5347, U.S.A.
J. R. Meyer
Affiliation:
Naval Research Laboratory, Washington, DC 20375-5347, U.S.A.
G. G. Jernigan
Affiliation:
Naval Research Laboratory, Washington, DC 20375-5347, U.S.A.
Get access

Abstract

While physical properties of ideal antimonide superlattices (ASL) indicate that they should significantly outperform mercury cadmium telluride (MCT) based infrared photodiodes for low dark current applications in the long and very long wave-infrared (LWIR and VLWIR), this potential has not yet been fully realized. Even though measured Auger and tunneling rates in ASL's are reduced as predicted, overall carrier lifetimes remain much shorter, and dark currents much higher than expected. The large carrier losses are the result of defects in the ASL structure, with contributions measured from large bulk defects and surface channels along mesa sidewalls, and the remaining component believed to be due to midgap states.

In this presentation we report on several studies of epitaxial growth parameters and their influence on defect formation. X-ray photoelectron spectroscopy analysis of oxide desorption from GaSb substrates shows the presence of both antimony and gallium oxides, along with their decomposition and desorption behavior with anneal temperature. A study of buffer growth shows that defect density and size are critically dependent on growth temperature, with an optimal growth window between 480 and 500 °C.. Side-by-side GaSb buffer growths on vicinal ((100) + 1 ° (111)) and flat (100) substrates show that while growing on vicinal material can suppress mound formation, it does not yield epilayers as flat as can be obtained on (100) substrates grown under optimal conditons. Finally, the ratio of As to In flux during superlattice growth can be used to tune the lattice parameter both above and below that of GaSb, with strain-related defects appearing when the mismatch reaches roughly 0.1%.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Smith, D. L. and Mailhiot, C., J. Appl. Phys. 62 2545 (1987).Google Scholar
2. Mohseni, H., Razeghi, M., Brown, G. J., and Park, Y. S., Appl. Phys. Lett. 78, 2107 (2001)Google Scholar
3. Kinch, M. A., J. Elec. Mat. 29 809 (2000).Google Scholar
4. Grein, C. H., Young, P. M., and Ehrenreich, H., Appl. Phys. Lett. 61 2905 (1992).Google Scholar
5. Youngdale, E. R., Meyer, J. R., Hoffman, C. A., Bartoli, F. J., Grein, C. H., Young, P. M., Ehrenreich, H., Miles, R. H., and Chow, D. H., Appl. Phys. Lett. 64 3160 (1994).Google Scholar
6. Tze, S. M., Physics of Semiconductor Devices, 2nd ed. (John Wiley and Sons, New York, 1969) p.98.Google Scholar
7. Fuchs, F., Weimer, U., Pletschen, W., Schmitz, J., Ahlswede, E., Walther, M., Wagner, J., and Koidl, P., Appl. Phys. Lett. 71, 3251 (1997)Google Scholar
8. Aifer, E. H., Bennett, B. R., Nosho, B. Z., Twigg, M. E., Vurgaftman, I., Meyer, J. R., Waterman, J. R., and Goldenberg, M., 2001 MSS Specialty Groups on Passive Sensors; Camouflage, Concealment and Deception; Detectors; and Materials, ed. IRIA Center, Vienna, VA, filename MTC02EA.pdf (2001).Google Scholar
9. Fuchs, F., Bürkle, L., Pletschen, W., Schmitz, J., Walther, M., Güllich, H., Herres, N., and Müller, S., Proc. SPIE 3794, 41 (1999)Google Scholar
10. Seah, M. P. and Dench, W. A., Surface and Interface Analysis, 1, 2 (1979)Google Scholar
11. Bracker, A. S., Yang, M. J., Bennett, B. R., Culbertson, J. C., and Moore, W. J., J. Cryst. Growth, 220, 384 (2000)Google Scholar
12. Nosho, B. Z., Bennett, B. R., Aifer, E. H., and Goldenberg, M., J Cryst. Growth. 236, 155 (2002)Google Scholar
13. Bennett, B. R., Shanabrook, B. V., Wagner, R. J., Davis, J. L., and Waterman, J. R., Appl. Phys. Lett. 63, 949 (1993)Google Scholar
14. Nosho, B.Z., Bennett, B.R., Whitman, L.J., and Goldenberg, M., J. Vac. Sci. Technol. B 19, 1626 (2001)Google Scholar
15. Xie, Qianghua, Nostrund, J. E. Van, Brown, J. L., and Stutz, C. E., J. Appl. Phys. 86, 329 (1999)Google Scholar
16. Steinshnider, J., Harper, J., Weimer, M., Lin, C. H., Pei, S. S., and Chow, D. H., Phys. Rev. Lett. 85, 4562 (2000)Google Scholar