Hostname: page-component-6bf8c574d5-8gtf8 Total loading time: 0 Render date: 2025-02-20T14:23:44.917Z Has data issue: false hasContentIssue false
  • English
  • Français

Superconducting yba2cu3o7‐x Thin Film on Metal Substrate by Chemical Vapor Deposition Process.

Published online by Cambridge University Press:  28 February 2011

T. Yamaguchi ,
S. Aoki ,
N. Sadakata  and
O. Kohno
T. Yamaguchi
Affiliation:
Fujikura Ltd., 1‐5‐1, Kiba, Koto‐ku, Tokyo 135, Japan
S. Aoki
Affiliation:
Fujikura Ltd., 1‐5‐1, Kiba, Koto‐ku, Tokyo 135, Japan
N. Sadakata
Affiliation:
Fujikura Ltd., 1‐5‐1, Kiba, Koto‐ku, Tokyo 135, Japan
O. Kohno
Affiliation:
Fujikura Ltd., 1‐5‐1, Kiba, Koto‐ku, Tokyo 135, Japan
Get access

Abstract

Superconducting YBa2Cu307_x thin films were prepared by chemical vapor deposition using beta‐diketonate chelates on various oxide substrates and metal substrates. According to X‐ray diffraction patterns, the existence of a well‐oriented orthorhombic YBagCUgO^x structure has been confirmed in all specimens. The temperature of complete superconducting transition were observed at 89K on single‐crystalline oxide substrate, and 84K on metal substrate. Reduced critical current density of the film on single‐crystalline substrate in magnetic fields up to 600mT at 77K remained one or two order of magnitude higher than that of the film on metal substrate.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 169: Symposium M – High Temperature Superconductors: Fundamental Properties and Novel Materials Processing , 1989 , 597
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Enomoto, Y., Murakami, T., Suzuki, M. and Moriwaki, K., Jpn.J.Appl.Phys. 26, L1248 (1987)Google Scholar
2 Oh, B., Naito, M., Arnason, S., Rosenthal, P., Barton, R., Beasley, M.R., Geballe, T.H., Hammond, R.H. and Kapitulunik, A., Appl.Phys.Lett. 51, 852 (1987)Google Scholar
3 Yamane, H., Masumoto, H., Hirai, T., Iwasaki, H., Watanabe, K., Kobayashi, N. and Muto, Y., Appl.Phys.Lett. 53, 1548 (1988)Google Scholar