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Sub-micron structured Metal Oxide gas sensors by means of lithographic techniques

Published online by Cambridge University Press:  01 February 2011

Patrizio Candeloro
Affiliation:
Sensor Lab – INFM, Chemistry and Physics department, University of Brescia, via Valotti 9, 25133 Brescia, Italy
Camilla Baratto
Affiliation:
Sensor Lab – INFM, Chemistry and Physics department, University of Brescia, via Valotti 9, 25133 Brescia, Italy
Elisabetta Comini
Affiliation:
Sensor Lab – INFM, Chemistry and Physics department, University of Brescia, via Valotti 9, 25133 Brescia, Italy
Guido Faglia
Affiliation:
Sensor Lab – INFM, Chemistry and Physics department, University of Brescia, via Valotti 9, 25133 Brescia, Italy
Enzo M. Di Fabrizio
Affiliation:
LILIT Beamline, TASC — INFM, S.S.14 km163.5, 34012 Basovizza (TS), Italy
Giorgio Sberveglieri
Affiliation:
Sensor Lab – INFM, Chemistry and Physics department, University of Brescia, via Valotti 9, 25133 Brescia, Italy
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Abstract

In this work we employed lithographic techniques, combined with sputtering depositions, to fabricate semiconductor metal-oxide (MOX) gas sensors with controlled grain dimensions. The basic idea is to replace the continuous sensing film of standard MOX sensors with a pattern of wires in the sub-micron scale, thus controlling the lateral size of the grains. Regarding the fabrication process, we followed two different approaches: a plain lift-off technique and a substrate patterning process. We present a comparison between the results of both the approaches. Furthermore, we tested the electrical responses to several gases and compared them with those of continuous film sensors. The experimental data highlight an improvement for the patterned sensors.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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References

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