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Study of the Effects of Si Addition on the Properties of Hard Nanocomposite Thin Films

Published online by Cambridge University Press:  26 July 2012

Jose Luis Endrino
Affiliation:
[email protected], Lawrence Berkeley National Laboratory, AFRD, 1 Cyclotron Rd. Building 53, Berkeley, CA, 94720, United States
Sergio Palacin
Affiliation:
[email protected], Universidad Autonoma de Madrid, Madrid, N/A, Spain
Alejandro Gutierrez
Affiliation:
[email protected], Universidad Autonoma de Madrid, Madrid, N/A, Spain
Myriam Aguirre
Affiliation:
[email protected], Empa-Swiss Federal Lab for Materials Testing and Research, Duebendorf, N/A, Switzerland
Franz Schäfers
Affiliation:
[email protected], BESSY GmbH, Berlin, N/A, Germany
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Abstract

In the present study, hard TiSiN coating compounds with different Si content have been deposited by the magnetron sputtering technique. X-ray diffraction (XRD) and X-ray absorption spectroscopy (XAS) have been employed to investigate the effects of Si addition on the composition, structure and phase development of the cubic NaCl-type structure. To get some insight on these changes, X-ray absorption spectra have been measured at the Ti and Si K-edges in fluorescence yield mode. The collected data showed that the interaction between Ti and Si was weak and the formation of a-Si3N4 can be assumed. Hardness measurements were also consistent with the formation of hard nanocomposite films. A maximum hardness of about 36 GPa was obtained for the sample with 11 at. % Si.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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