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Studies of the Early Oxidation of Silicon (111) in Atomic Oxygen*

Published online by Cambridge University Press:  25 February 2011

Bhola N. De ,
Jane Hruska ,
Jane Peterkin ,
Yong Zhao  and
John A. Woollam
Bhola N. De
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511.
Jane Hruska
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511.
Jane Peterkin
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511.
Yong Zhao
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511.
John A. Woollam
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511.
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Abstract

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 163: Symposium G – Impurities, Defects and Diffusion in Semiconductors: Bulk and Layered Structures , 1989 , 965
Copyright
Copyright © Materials Research Society 1990

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Footnotes

*

Research supported by NASA Lewis Research Center Grant No. NAG-3-95.

References

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