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Studies of Si Surface Chemistry and Epitaxy Using Scanning Tunneling Microscopy and Spectroscopy

Published online by Cambridge University Press:  25 February 2011

Phaedon Avouris  and
Robert Wolkow
Phaedon Avouris
Affiliation:
IBM Research Division, T. J. Watson Research Center, Yorktown Heights, NY 10598.
Robert Wolkow
Affiliation:
IBM Research Division, T. J. Watson Research Center, Yorktown Heights, NY 10598.
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Abstract

We apply scanning tunneling microscopy (STM) and spectroscopy (STS) to study the reaction of NH3 with Si(111)-(7×7), and the epitaxial growth of CaF2 on Si(11). By a combination of topographs and atom-resolved spectra we can follow the spatial distribution of the reaction and changes in electronic structure with atomic resolution. We find that there are strong site-selectivities for the NH3 reaction on the 7×7 surface. We also observe the initial stages of the CaF2 deposition and even are able to image insulating multi-layer CaF2 films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 131: Symposium E – Chemical Perspectives of Microelectronic Materials I , 1988 , 157
Copyright
Copyright © Materials Research Society 1989

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References

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