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Structural Transitions in Titanium-Aluminum Thin Film Multilayers

Published online by Cambridge University Press:  15 February 2011

Rajiv Ahuja  and
Hamish L. Fraser
Rajiv Ahuja
Affiliation:
Department of Materials Science and Engineering, The Ohio State University, 116W 19th Ave, Columbus, OH 43210
Hamish L. Fraser
Affiliation:
Department of Materials Science and Engineering, The Ohio State University, 116W 19th Ave, Columbus, OH 43210
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Abstract

This paper presents the results of a detailed study of titanium - aluminum thin film multilayers fabricated using UHV Magnetron sputtering. Transmission electron Microscopy (TEM) techniques have been used to characterize the structure of these multilayers and to study the various structural transitions as a function of the composition modulation wavelength (CMW). Evidence is presented which indicates the existence of a titanium based fcc structure in these films, below a critical CMW. At even smaller values of CMW, both the Ti and Al layers adopt the hep structure and are coherent with each other. The evolution of thin film microstructure has been studied using high resolution TEM (HRTEM) and an attempt is made to rationalize the stability of different phases based on the energetics of atomic stacking.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 317: Symposium B – Mechanisms of Thin Film Evolution , 1993 , 479
Copyright
Copyright © Materials Research Society 1994

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References

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