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Structural Transition in Cu/Fe Multilayered Thin Films

Published online by Cambridge University Press:  10 February 2011

Tai D. Nguyen ,
Alison Chaiken  and
Troy W. Barbee Jr.
Tai D. Nguyen
Affiliation:
Chemistry and Materials Science Department, Lawrence Livermore National Laboratory, Livermore, CA 94550.
Alison Chaiken
Affiliation:
Chemistry and Materials Science Department, Lawrence Livermore National Laboratory, Livermore, CA 94550.
Troy W. Barbee Jr.
Affiliation:
Chemistry and Materials Science Department, Lawrence Livermore National Laboratory, Livermore, CA 94550.
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Abstract

Microstructural development of Fe and Cu in Cu/Fe multilayers of layer thickness 1.5–10 nm prepared on Si, Ge, and MgO substrates by ion beam sputtering has been studied using x-ray diffraction and cross-sectional transmission electron microscopy (TEM). High-angle x-ray results show an fcc Cu structure and a distorted bcc structure in the Fe layers at 5 nm-layer-thickness and smaller, and bcc Fe (110) and fcc Cu (111) peaks in the 10 nm-layer-thickness samples. Lowangle x-ray diffraction indicates that the layers in the samples grown on MgO substrates have a more uniform and smooth layered structure than the multilayers grown on Si and Ge substrates, which results from larger grains in the MgO substrate samples for the same layer thickness. Relationships among growth, microstructure, and interfaces with layer thickness are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 441: Thin Films – Structure and Morphology , 1996 , 353
Copyright
Copyright © Materials Research Society 1997

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