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Structural factors determining the nanomechanical performance of transition metal nitride films

Published online by Cambridge University Press:  01 February 2011

K. Sarakinos
Affiliation:
Aristotle University of Thessaloniki, Department of Physics, GR-54124, Thessaloniki, Greece
S. Kassavetis
Affiliation:
Aristotle University of Thessaloniki, Department of Physics, GR-54124, Thessaloniki, Greece
P. Patsalas
Affiliation:
Aristotle University of Thessaloniki, Department of Physics, GR-54124, Thessaloniki, Greece
S. Logothetidis
Affiliation:
Aristotle University of Thessaloniki, Department of Physics, GR-54124, Thessaloniki, Greece
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Abstract

Chromium nitride (CrN) and Titanium nitride (TiN) thin films were deposited employing unbalanced magnetron sputtering (UBMS) for various values of substrate bias voltage (Vb). The structural characterization of the films in terms of phase identification and the density determination was achieved utilizing X-Ray techniques (XRD and XRR respectively), while the internal stresses were calculated by the change of the substrate's curvature using Stoney's equation. The nanomecahnical properties of the films (hardness and elastic modulus) were investigated using the Nanoindentation (NI) technique in the Continuous Stiffness Measurement (CSM) configuration. According to the NI results the hardness of the films ranges between between 15–25 GPa while the elastic modulus between 180–250 GPa. The analysis revealed that the hardness of the films is maximum when their orientation is pure (either [111] or [100]), while it is minimized under mixed orientation regime. Furthermore, the hardness of the films increases as the internal compressive stresses and the mass density increase. The latter can be validated through the comparison of the results concerning the above films to reported results for TiN films prepared by balanced magnetron sputtering (BMS)

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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