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Structural characterization of different insulating films by spectroscopic ellipsometry and grazing x‐ray reflectance

Published online by Cambridge University Press:  10 February 2011

P. Boher ,
J.L. Stehle  and
L. Hennet
P. Boher
Affiliation:
Sopra S.A., 26 rue Pierre Joigneaux92270 Bois‐Colombes (France)
J.L. Stehle
Affiliation:
Sopra S.A., 26 rue Pierre Joigneaux92270 Bois‐Colombes (France)
L. Hennet
Affiliation:
Université Henry Poincaré, Nancy 1, BP 239
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Abstract

Spectroscopic Ellipsometry (SE) and Grazing X‐ray Reflectance (GXR) techniques are applied for different insulating films to determine precisely the thickness and optical indices of the layers. Antireflective coatings for microlithography in the DUV range are first analyzed. In the infrared range the layers are transparent and one can take into account the optical index of the layers by a simple dispersion law. Thicknesses obtained by this method are checked by the GXR technique. Extraction of the optical indices from UV to IR is made very accurately taking into account different SE measurements at various incident angles simultaneously. Amorphous carbon thin films are also analyzed in the same way. The main difference is that the layer is absorbant in the entire wavelength range. In this case, a first characterization by the GXR technique is essential to extract the thickness of the layer. Then the optical indices of the layer can be extracted very accurately by SE.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 446: Amorphous and Crystalline Insulating Thin Films–1996 , 1996 , 369
Copyright
Copyright © Materials Research Society 1997

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References

1 Dammel, R.R., Antireflective coatings: sultans of the swing curve, Semiconductor Fabtech, p. 215(1995).Google Scholar
2 Lamb, J.E., Organic ARC: antireflective coating application within the microelectronics industry, Semiconductor Fabtech, p. 223 (1995)Google Scholar
3 Boher, P., Houdy, P., Schiller, C., J. Appi. Physics, 68, p. 6133 (1990)Google Scholar
4 Bridou, F., Pardo, B., J. de Physique IV, Vol. 6, pp. C4‐367‐C4‐383 (1996)Google Scholar
5 Boher, P., Piel, J.P., Stenle, J.L., J. of Crystal Growth, 157, pp. 73‐79 (1995)Google Scholar
6 Boher, P., Stehle, J.L., Presented at the 1995 MRS Fall Meeting, Boston, November 27 ‐December 1.Google Scholar
7 Boher, P., Stehle, J.L., Hennet, L., Presented at the EMRS Spring Meeting, Strasbourg (1996)Google Scholar
8 Boher, P., Piel, J.P., Defranoux, C., Stehle, J.L., Hennet, L., SPIE vol. 2726, pp. 608‐620 (1996)Google Scholar
9 Bobo, J., Baylac, B., Hennet, L., Lenoble, O., Piecuch, M., Raqet, B., Ousset, J., Viel, V., Snoeck, ., J. of Magn and Magn. Mat., 121, p. 291 (1993)Google Scholar
10 WinElli software version 3.02, SOPRA S.A. (1996)Google Scholar
11 Forouhi, A.R., Bloomer, I., Phys. Rev., 115, p. 786 (1986)Google Scholar