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Stress Evolution During the Formation and Transformation of Titanium Silicide

Published online by Cambridge University Press:  21 February 2011

V. Svilan ,
J. M. E. Harper ,
C. Cahral Jr.  and
L. A. Clevengeri
V. Svilan
Affiliation:
Massachusetts Institute of Technology, Cambridge, MA 02139
J. M. E. Harper
Affiliation:
IBM Thomas J. Watson Research Center, Yorktown Heights, NY 10598
C. Cahral Jr.
Affiliation:
IBM Thomas J. Watson Research Center, Yorktown Heights, NY 10598
L. A. Clevengeri
Affiliation:
IBM Thomas J. Watson Research Center, Yorktown Heights, NY 10598
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Abstract

The evolution of stress vs. temperature was measured during the formation of TiSi2 in the reaction of Ti with (100) Si and with polycrystalline Si, and during the phase transformation from C49 to C54 TiSi2. The formation of C49 TiSi2 causes an increase in compressive stress, followed by relaxation before the transformation to C54 TiSi2, which causes no significant stress change. C54 TiSi2 is shown to be elastic in the temperature range of 750–860 °C. This difference in the deformation mechanisms of C49 and C54 TiSi2 affects the morphological stability of TiSi2 in fine line structures.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 356: Symposium B2 – Thin Films: Stresses and Mechanical Properties V , 1994 , 167
Copyright
Copyright © Materials Research Society 1995

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