Hostname: page-component-78c5997874-v9fdk Total loading time: 0 Render date: 2024-11-20T00:41:26.287Z Has data issue: false hasContentIssue false
  • English
  • Français

Stress and Microstructure in Rf-Diode and Dc-Magnetron Sputtered Beryllium Thin Films

Published online by Cambridge University Press:  22 February 2011

Risto H. Mutikainen
Risto H. Mutikainen*
Affiliation:
Technical Research Centre of Finland, Semiconductor Laboratory, Otakaari 7 B, SF-02150 Espoo, Finland
Get access

Abstract

The effect of deposition parameters on the properties of sputtered Be films has been studied. The parameters have been optimized to obtain stress free films. Nitrogen pulsing has been used to improve the film microstructure by suppressing the columnar grain growth.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 239: Symposium D – Thin Films: Stresses and Mechanical Properties III , 1991 , 45
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Hoffman, D. w., Thornton, J. A., J. Vac. Sci. Technol. 12 (1), 380, 1980.Google Scholar
[2] vink, T. J., van Zon, J. B. A. D., J. Vac. Sci. Technol. A9(1) 124, 1991.Google Scholar
[3] Burt, R. J., Meyer, S. F., Hsieh, E. J., J. Vac. Sci. Technol. 11(1), 407, 1980.Google Scholar
[4] Hsieh, E. J., Price, C. W., Pierce, E. L., Wirtenson, R. G., J. Vac. Sci. Technol. A8 (3), 2165, 1990.Google Scholar