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Stress and Hardness of CrNx films

Published online by Cambridge University Press:  15 March 2011

G.C.A.M. Janssen ,
J.-D. Kamminga  and
W.G.M. Sloof
G.C.A.M. Janssen
Affiliation:
Department of Material Science and Technology, Delft University of Technology, the Netherlands, e-mail: [email protected]
J.-D. Kamminga
Affiliation:
Netherlands Institute for Metals Research, Delft, the Netherlands
W.G.M. Sloof
Affiliation:
Department of Material Science and Technology, Delft University of Technology, the Netherlands, e-mail: [email protected]
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Abstract

Chromium nitride films CrNx with x ranging form 0 to 1 were deposited by reactive PVD. Both stress and hardness in the films are a function of the composition. The growth stress and hardness for the majority of the films can be related through the Hall Petch relation. It is shown that the hardest films fall outside this relation. It is also shown that the hardest films are nanocrystalline. It is argued that the hardness of these films is a consequence of the nanocrystallinity of these films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 703: Symposia U/V – Nanophase and Nanocomposite Materials IV , 2001 , V3.24
Copyright
Copyright © Materials Research Society 2002

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References

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