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Strain control in SrRuO3 thin films by using a lattice constant tunable buffer

Published online by Cambridge University Press:  01 February 2011

K. Terai ,
T. Ohnishi ,
M. Lippmaa ,
H. Koinuma  and
M. Kawasaki
K. Terai
Affiliation:
Institute for Solid State Physics, University of Tokyo, Kashiwa, 277–8581, Japan.
T. Ohnishi
Affiliation:
Institute for Solid State Physics, University of Tokyo, Kashiwa, 277–8581, Japan.
M. Lippmaa
Affiliation:
Institute for Solid State Physics, University of Tokyo, Kashiwa, 277–8581, Japan.
H. Koinuma
Affiliation:
Frontier Collaborative Research Center, Tokyo Institute of Technology, Yokohama, 226–8503, Japan.
M. Kawasaki
Affiliation:
Institute for Materials Research, Tohoku University, Sendai, 980–8577, Japan.
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Abstract

Heteroepitaxial oxide thin films are usually grown on single crystal substrate which offer a similar lattice constant as the target material. In general, there are no substrates that are suitable for film fabrication and have a good lattice matching. In our previous report, we succeeded in fabricating a lattice constant tunable buffer by using a Ba1-xSrxTiO3 / BaTiO3 bilayer structure on SrTiO3. The in-plane lattice constant of the buffer layer can be tuned from 3.91 to 3.99 Å and the lattice constant is determined only by the Ba/Sr ratio in the Ba1-xSrxTiO3 layer. The buffer is suitable for growing both strain-free films and strained films. In this report we demonstrate the use of the lattice constant tunable buffer for strain control in SrRuO3 magnetic thin films. SrRuO3 has a magnetic anisotropy which changes under lattice strain. We show that the easy axis of magnetization is parallel to the film surface under tensile strain on a Ba0.5Sr0.5TiO3 buffer. The easy axis is perpendicular to the surface in compressively strained films. The tensile strain in a film also results in an increase of the ferromagnetic ordering temperature from a bulk value of 160 K to 164 K.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 795: Symposium U – Thin Films - Stresses and Mechanical Properties X , 2003 , U5.10
Copyright
Copyright © Materials Research Society 2004

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References

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