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Stability of Self-Assembled Organic-Inorganic Layered Perovskite

Published online by Cambridge University Press:  10 February 2011

Nobuaki Kitazawa
Affiliation:
Department of Materials Science and Engineering, National Defense Academy, 1–10–20 Hashirimizu, Yokosuka, Kanagawa 2398686, Japan
Takafumi Yamamoto
Affiliation:
Department of Materials Science and Engineering, National Defense Academy, 1–10–20 Hashirimizu, Yokosuka, Kanagawa 2398686, Japan
Yoshihisa Watanabe
Affiliation:
Department of Materials Science and Engineering, National Defense Academy, 1–10–20 Hashirimizu, Yokosuka, Kanagawa 2398686, Japan
Yoshikazu Nakamura
Affiliation:
Department of Materials Science and Engineering, National Defense Academy, 1–10–20 Hashirimizu, Yokosuka, Kanagawa 2398686, Japan
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Abstract

Photo-stability of (C6H5C2H4NH3)2PbX4 (X; Br and I) films was studied and the degradation processes were discussed. The prepared films were not stable against the UV-light irradiation. The PhE-PbX4 films were readily oxidized by the UV-light irradiation in air. In vacuum, the PhE-PbI4 films changed to β-phenethylamine intercalated PbI2 due to the elimination of halogen species. On the contrary, no degradation was observed for the PhE-PbBr4 films. These results suggested that the photo-irradiation induced photochemical reaction was one of the possible reasons for the degradation. To suppress the oxidation and halogen elimination induced by the photochemical reaction, PMMA-coated PhE-PbX4 films were also fabricated and their photo-stability was examined.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

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References

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