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Sputtered Fitas of Amorphous Hydrogenated Silicon Carbide

Published online by Cambridge University Press:  25 February 2011

Richard B. Rizk ,
Alain E. Kaloyeros ,
Wendell S. Williams ,
Nancy Finnegan  and
Carol Kozlowski
Richard B. Rizk
Affiliation:
Materials Research Laboratory and Department of Physics, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801
Alain E. Kaloyeros
Affiliation:
Materials Research Laboratory and Department of Physics, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801
Wendell S. Williams
Affiliation:
Materials Research Laboratory and Department of Physics, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801
Nancy Finnegan
Affiliation:
Materials Research Laboratory and Department of Physics, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801
Carol Kozlowski
Affiliation:
Materials Research Laboratory and Department of Physics, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801
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Extract

The field of amorphous hydrogenated silicon-carbon alloys and thin films has witnessed, since the pioneering work of Anderson and Spear [1], rapid development and has attracted scientific attention and technological interest [2,3]. However, relatively little information is known [4] about the physical mechanisms that govern the inclusion of C and H in the silicon matrix, the nature of the chemical bonds involved, and the structural changes that result in the amorphous phase. Clearly, further fundamental studies are needed to achieve complete understanding of such amorphous systems with variable disorder.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 97: Symposium I – Novel Refractory Semiconductors , 1987 , 295
Copyright
Copyright © Materials Research Society 1987

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References

REFERENCES

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