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SPM-Based Lithography for Electronics Device Fabrication: New Strategies and Directions

Published online by Cambridge University Press:  15 February 2011

J. A. Dagata
J. A. Dagata*
Affiliation:
Precision Engineering Division, National Institute of Standards and Technology, Gaithersburg MD 20899
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Abstract

Direct patterning of a semiconductor surface to produce an ultrathin oxide mask has proven to be a promising approach for integrating lithographic methods based on scanned probe microscopy (SPM) into existing electronics device processing. The resulting masks are capable of withstanding the necessary etching and thermal cycling required for pattern development. Recent work has validated the concept for the fabrication of silicon devices. The current challenges which face this active research area will now require a detailed, predictive understanding of the mechanism responsible for oxidation within an SPM junction in order for the process to optimized with respect to write speed, resolution, and reliability.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 380: Symposium D – Materials–Fabrication and Patterning at the Nanoscale , 1995 , 153
Copyright
Copyright © Materials Research Society 1995

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References

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