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Spm Based Lithography for Nanometer Scale Electrodes Fabrication

Published online by Cambridge University Press:  10 February 2011

A. Notargiacomo ,
E. Giovine ,
E. Cianci ,
V. Foglietti  and
F. Evangelisti
A. Notargiacomo
Affiliation:
Instituto di Elettronica dello Stato Solido (IESS), CNR, Roma, Italy
E. Giovine
Affiliation:
Unità INFM, Dip. di Fisica “E. Amaldi”, Università di Roma TRE, Roma, Italy
E. Cianci
Affiliation:
Osservatorio Astronomico di Roma, Monteporzio Catone, Italy, [email protected]
V. Foglietti
Affiliation:
Instituto di Elettronica dello Stato Solido (IESS), CNR, Roma, Italy
F. Evangelisti
Affiliation:
Instituto di Elettronica dello Stato Solido (IESS), CNR, Roma, Italy Unità INFM, Dip. di Fisica “E. Amaldi”, Università di Roma TRE, Roma, Italy
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Abstract

Scanning probe assisted nanolithography is a very attractive technique in terms of low-cost, patterning resolution and positioning accuracy. Our approach makes use of a commercial atomic force microscope and silicon probes to build simple nanostructures, such as metal electrode pairs, for application in novel quantum devices.

Sub-100 nm patterning was successfully performed using three different techniques: direct material removal, scanning probe assisted mask patterning and local oxidation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 584 , 1999 , 319
Copyright
Copyright © Materials Research Society 2000

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