Hostname: page-component-cd9895bd7-dk4vv Total loading time: 0 Render date: 2024-12-27T02:11:36.464Z Has data issue: false hasContentIssue false
  • English
  • Français

Spatial Resolution of Small Particles in Silane Discharge

Published online by Cambridge University Press:  21 February 2011

K. G. Spears  and
R. M. Roth
K. G. Spears
Affiliation:
Northwestern University, Department of Chemistry, Evanston, IL 60201
R. M. Roth
Affiliation:
Currently at Standard Oil Company (Indiana), Amoco Research Center, P. O. Box 400 Naperville, IL 60566
Get access

Abstract

A capacitively coupled, rf glow discharge of silane in argon was studied with laser light scattering to determine the spatial concentration of small particles. Multi-wavelength scattering profiles have been obtained and are being analyzed to obtain size distributions as a function of spatial location. Very sharply defined particle zones can be found under some plasma conditions that are spatially related to the silicon atom profiles. We will report our results and attempt to qualitatively describe how these zones relate to plasma chemistry and film deposition processes.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 38: Symposium F – Plasma Synthesis and Etching of Electronic Materials , 1984 , 111
Copyright
Copyright © Materials Research Society 1985

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Breiland, W. G. and Kushner, M. J., Appl. Phys. Lett. 42, 395 (1983).Google Scholar
2. Ho, P. and Breiland, W. G., Appl. Phys. Lett. 44, 51 (1984).Google Scholar
3. Inone, G. and Suzuki, M., Chem. Phys. Lett. 105, 641 (1984).CrossRefGoogle Scholar
4. Roth, R. M., Spears, K. G., Stein, G. D. and Wong, G., to be published in Appl. Phys. Lett.Google Scholar
5. Roth, R. M., Spears, K. G. and Wong, G., Proceeding of a Symposium on Plasma Synthesis and Etching of Electronic Materials, Material Research Society, Boston, Nov. 1984.Google Scholar
6. Roth, R. M., Spears, K. G. and Wong, G., Appl. Phys. Lett. 45, 29 (1984).Google Scholar