Hostname: page-component-cd9895bd7-gxg78 Total loading time: 0 Render date: 2024-12-27T01:35:36.957Z Has data issue: false hasContentIssue false
  • English
  • Français

“Smart” Defects in Colloidal Photonic Crystals

Published online by Cambridge University Press:  26 February 2011

Friederike Fleischhaker ,
André C. Arsenault ,
Nicolas Tétreault ,
Zhuo Wang ,
Vladimir Kitaev ,
Frank Peiris ,
Agustin Mihi ,
Hernan Miguez ,
Georg von Freymann  and
Ian Manners
...Show all authors
Friederike Fleischhaker
Affiliation:
[email protected], University of Toronto, Department of Chemistry, 80 St. George Street, Toronto, Ontario, M5S 3H6, Canada
André C. Arsenault
Affiliation:
[email protected], University of Toronto, Department of Chemistry
Nicolas Tétreault
Affiliation:
[email protected], University of Toronto, Department of Chemistry, Canada
Zhuo Wang
Affiliation:
[email protected], University of Toronto, Department of Chemistry, Canada
Vladimir Kitaev
Affiliation:
[email protected], University of Toronto, Department of Chemistry
Frank Peiris
Affiliation:
[email protected], University of Toronto, Department of Chemistry, Canada
Agustin Mihi
Affiliation:
[email protected], Instituto de Ciencia de Materiales de Sevilla, Spain
Hernan Miguez
Affiliation:
[email protected], Instituto de Ciencia de Materiales de Sevilla, Spain
Georg von Freymann
Affiliation:
[email protected], University of Toronto, Department of Chemistry, Canada
Ian Manners
Affiliation:
[email protected], University of Toronto, Department of Chemistry, Canada
Rudolf Zentel
Affiliation:
[email protected], University of Mainz, Department of Chemistry and Pharmacy, Germany
Geoffrey A. Ozin
Affiliation:
[email protected], University of Toronto, Department of Chemistry, Canada
Get access

Abstract

We present a bottom-up approach for the construction of "Smart" active defects in colloidal photonic crystals (CPCs). These structures incorporate polyelectrolyte multilayer (PEM) planar defects embedded in silica CPCs through a combination of evaporation induced self-assembly and microcontact transfer printing. We show how the enormous chemical diversity inherent to PEMs can be harnessed to create chemically active defect structures responsive to solvent vapor pressures, light, temperature as well as redox cycling. A sharp transmission state within the photonic stopband, induced by the PEM defect, can be precisely, reproducibly and in some cases reversibly tuned by these external stimuli.

These materials could find numerous applications as optically monitored chemical sensors, adjustable notch filters and CPC-based tunable laser sources.

Keywords

colloiddefectsself-assembly
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 901: Symposium R – Assembly at the Nanoscale – Toward Functional Nanostructured Materials , 2005 , 0901-Ra22-27-Rb22-27
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 John, S., Phys. Rev. Lett. 58, 2486 (1987)Google Scholar
2 Yablonovitch, E., Phys. Rev. Lett. 58, 2059 (1987)Google Scholar
3 Joannopoulos, J. D.; Villeneuve, P. R., Fan, S. H.. Nature 387, 830 (1997)Google Scholar
4 Busch, K., John, S. Phys. Rev. E 58, 3896 (1998)Google Scholar
5 Xia, Y. N., Gates, B., Yin, Y. D., Lu, Y., Adv. Mater. 12, 693 (2000)Google Scholar
6 Stöber, W., Fink, A., Bohn, E. J., J. Colloid Interface Sci. 26, 62 (1968)Google Scholar
7 Jiang, P., Bertone, J. F., Hwang, K. S., Colvin, V. L., Chem. Mater. 11, 2132 (1999)Google Scholar
8 Miguez, H., Tetreault, N., Hatton, B., Yang, S. M., Perovic, D., Ozin, G. A., Chem. Commun., 2736 (2002)Google Scholar
9 Park, J., Hammond, P. T., Adv. Mater. 16, 520 (2004)Google Scholar
10 Wang, Z., Lough, A., Manners, I., Macromol. 35, 7669 (2002)Google Scholar
11 Jäkle, F., Wang, Z., Manners, I., Macromol. Rapid Commun., 21, 1291 (2000)Google Scholar
12 Shung, K. W. K., Tsai, Y. C., Phys. Rev. B, 48, 11265 (1993)Google Scholar
13 Dante, S., Advincula, R., Frank, C. W., Stroeve, P., Langmuir, 15, 19 (1999)Google Scholar