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Size-controlled deposition of Ag and Si nanoparticle structures with gas-aggregated sputtering

Published online by Cambridge University Press:  21 May 2013

Cathal Cassidy ,
Vidyadhar Singh ,
Zafer Hawash ,
Murtaza Bohra ,
Jeong-Hwan Kim  and
Mukhles Sowwan
Cathal Cassidy
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Vidyadhar Singh
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Zafer Hawash
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Murtaza Bohra
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Jeong-Hwan Kim
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Mukhles Sowwan
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
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Abstract

Physical vapor deposition, in combination with gas-aggregation (PVD-GA), is a controllable method for creation of diverse nanoparticle structures. Given the size effects that dominate the physics of nanoparticles, a particular advantage of the PVD-GA technique is the compatibility with in situ mass filtering of the nanocluster beam.

In the current work, PVD-GA has been utilized to deposit Ag and Si nanoparticles. Nanoparticles were analyzed using in situ quadrupole mass spectrometry (charge/mass ratio), atomic force microscopy (nanoparticle height), and transmission electron microscopy (nanocluster diameter & crystallinity). The results for particle size distribution were cross-correlated, with excellent agreement.

Different growth methods & conditions were explored, resulting in controlled differences in the measured particle size distributions and surface coverage. A novel growth configuration utilizing a conventional sputter source in combination with a linear magnetron allowed a significant (fivefold) increase in Ag cluster yield.

Keywords

nanostructuresputteringSi
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1546: Symposium L – Nanoparticle Manufacturing, Functionalization, Assembly and Integration , 2013 , mrss13-1546-l06-44
Copyright
Copyright © Materials Research Society 2013 

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References

REFERENCES

Lee, K.C. et al. , Surface Coatings and Technology 202 (2008) 5339–5342.CrossRefGoogle Scholar
Park, N.M. et al. , Appl. Phys. Lett., Vol. 78, No. 17 (2001) 2574–2577.Google Scholar
Enriquez, H. et al. , J. Phys.: Condens. Matter 24 (2012) 314211.Google Scholar
Haberland, H. et al. ., J. Vac. Sci. Technol. A 12(5), 1994, 2925–2930.CrossRefGoogle Scholar
Stranak, V. et al. , Surface Coatings and Technology 205 (2011) 2755–2762.CrossRefGoogle Scholar
Gracia-Pinilla, M. et al. , Nanoscale Res Lett (2010) 5:180–188.CrossRefGoogle Scholar
Nielsen, R.M. et al. , J Nanopart Res (2010) 12:1249–1262.CrossRefGoogle Scholar
Miller, E.M. et al. , Journal of Chemical Education, Volume 63 Issue 7 pp617–622, 1986.CrossRefGoogle Scholar
Ganeva, M., et al. ., Contrib. Plasma Phys., 1–10 (2012).Google Scholar
Rasband, W., ImageJ Version 1.47c, National Institute for Health, USA, http://imagej.nih.gov/ij.Google Scholar
Lacava, L.M. et al. , J. Magn. Magn. Mater 225 (2001) 79–83.CrossRefGoogle Scholar
Polonskyi, O. et al. , Thin Solid Films 520 (2012) 4155–4162.CrossRefGoogle Scholar