Hostname: page-component-586b7cd67f-rdxmf Total loading time: 0 Render date: 2024-11-29T06:57:57.037Z Has data issue: false hasContentIssue false
  • English
  • Français

Single-Source Precursors to Niobium Nitride and Tantalum Nitride Films

Published online by Cambridge University Press:  22 February 2011

Charles H. Winter ,
Kumudini C. Jayaratne  and
James W. Proscia
Charles H. Winter
Affiliation:
Department of Chemistry, Wayne State University, Detroit, MI 48202
Kumudini C. Jayaratne
Affiliation:
Department of Chemistry, Wayne State University, Detroit, MI 48202
James W. Proscia
Affiliation:
Ford Motor Company, Glass Division, Dearborn, MI 48120
Get access

Abstract

Herein we report our efforts to prepare new precursors to niobium nitride (NbN) and tantalum nitride (TAN, Ta3N5) thin films. Treatment of MC15 (M = Nb, Ta) with tertbutylamine in benzene solvent affords complexes of the formula [MCI2 (NtBu)(NHtBu)(NH2tBu)]2. The niobium complex [NbC12(NtBu)(NHtBu)- (NH2tBu)]2 affords NbN films on glass substrates between 500-600 °C, while the tantalum analog [TaC12(NtBu)(NHtBu)(NH2tBu)]2 gives films of Ta3N5 in this temperature range. Treatment of MCI5 (M = Nb, Ta) with 1,1-dimethylhydrazine in dichloromethane solvent affords complexes of the formula [MC12(NNMe2)(NHNMe2)(NH2NMe2)]n. These hydrazido complexes afford cubic MN films upon glass substrates at ≥400°C. Analyses of the films are presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 327: Symposium N – Covalent Ceramics II: Non-Oxides , 1993 , 103
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Oya, G.-I. and Onodera, Y., J. Appl. Phys. 45, 1389 (1974).Google Scholar
2. For representative references, see: Anderson, A.C., Lichtenwalner, D.J., Brogan, W.T., IEEE Trans. Mag. 25, 2084 (1989). S.Yano, Y. Tarutani, H. Mori, H. Yamada, M. Hirano, U. Kawabe, IEEE Trans. Mag. 23, 1472 (1987). S. Thakoor, J.L. Lamb, A.P. Thakoor, S.K. Khanna, J. Appl. Phys. 58, 4643 (1985). G.-I. Oya and Y. Onodera, J. Vac. Sci. Technol. 7, S44 (1971).Google Scholar
3. Wittmer, M., Appl Phys. Lett. 36, 456, (1980). 36, 540 (1980).Google Scholar
4. Fix, R., Gordon, R.G., Hoffman, D.M., Chem. Mater. 5, 614 (1993).Google Scholar
5. Hieber, K., Thin Solid Films, 24, 157 (1974).Google Scholar
6. Takahashi, T., Itoh, H., Ozeki, S., J. Less Common Met. 52, 29 (1977).Google Scholar
7. For example, see: Azuma, M., Nakato, Y., Tsubomura, H., J. Electroanal. Chem. 255, 179 (1988). H.J. Coyne, Jr., R.N. Tauber, J. Appl. Phys. 39, 5585 (1968).Google Scholar
8. Chiu, H.-T., Chang, W.-P., J. Mat. Sci. Lett. 11, 96 (1992).Google Scholar
9. Sugiyama, K., Pac, S., Takahashi, Y., Motojima, S., J. Electrochem. Soc. 122, 1545 (1975).Google Scholar
10. (a) Winter, C.H., Sheridan, P.H., Lewkebandara, T.S., Heeg, M.J., Proscia, J.W., J. Am. Chem. Soc. 114, 1095 (1992). (b) C.H. Winter, P.H. Sheridan, T.S. Lewkebandara, and J.W. Proscia in Chemical Perspectives of Microelectronic Materials III, edited by C.R. Abernathy, C.W. Bates, Jr., D.A. Bohling, and W.S. Hobson (Mat. Res. Soc. Symp. Proc. 282, Pittsburgh, Pa, 1993) 293-298.Google Scholar
11. Bates, P.A., Nielson, A.J., Waters, J.M., Polyhedron 4, 1391 (1985).Google Scholar
12. Winter, C.H., Jayaratne, K.C., Lewkebandara, T.S., Guzei, I., Proscia, J.W., manuscript in preparation (unpublished).Google Scholar
13. Winter, C.H., Lewkebandara, T.S., Proscia, J.W., Rheingold, A.L., Inorg. Chem. 32, 3807 (1993).Google Scholar
14. JCPDS files are superimposed upon the experimental spectra. NbN: Index No. 34–337. Nb2N: Index No. 20–802. Ta3N5: Index No. 19–1291. TaN: Index No. 32–1283. Powder Diffraction File, editor in chief: McClune, W.F. (JCPDS International Center for Diffraction Data, Swarthmore, PA 19081-2389, USA)Google Scholar
15. For a discussion of data handling in x-ray photoelectron spectroscopy, see: Wagner, C.D., Riggs, W.M., Davis, L.E., Moulder, J.F., and Murlenberg, G.E., Handbook of X-Ray Photoelectron Spectroscopy, (Perkin Elmer Corp., Physical Electronics Division: Eden Prairie, Minnesota, 1979)Google Scholar