Hostname: page-component-586b7cd67f-t7czq Total loading time: 0 Render date: 2024-11-25T17:38:44.656Z Has data issue: false hasContentIssue false
  • English
  • Français

Single & Multiple Pulse Ablation of Polymeric and High Density Materials with Excimer Laser Radiation at 193NM and 248NM

Published online by Cambridge University Press:  25 February 2011

David J. Elliott ,
Ernhard P. Piwczyk ,
David J. Elliott  and
Bernhard P. Piwczyk
David J. Elliott
Affiliation:
IMAGE MICRO SYSTEMS, INC., 900 Middlesex Turnpike, Bldg #8, Billerica, Massachusetts 01821
Ernhard P. Piwczyk
Affiliation:
IMAGE MICRO SYSTEMS, INC., 900 Middlesex Turnpike, Bldg #8, Billerica, Massachusetts 01821
David J. Elliott
Affiliation:
IMAGE MICRO SYSTEMS, INC., 900 Middlesex Turnpike, Bldg #8, Billerica, Massachusetts 01821
Bernhard P. Piwczyk
Affiliation:
IMAGE MICRO SYSTEMS, INC., 900 Middlesex Turnpike, Bldg #8, Billerica, MA 01821
Get access

Abstract

The evolution of the excimer laser from a research tool in the 1970's to the industrial models of the 1980's has opened up numerous applications in semiconductor manufacturing, materials processing, and biological and medical research. Present production-capable, computercontrolled excimer systems with handling equipment enabling efficient automation can now operate for up to 50 million shots before undergoing scheduled maintenance, with fluences remaining within ±10% in most cases. Thus, although many uses for the excimer laser are still researchoriented, production applications are rapidly emerging.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 129: Symposium B – Laser and Particle-Beam Modification of Chemical Processes on Surfaces , 1988 , 627
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Egger, H., Pummer, H., and Rhodes, C.K., EXCIMER LASERS FOR THE GENERATION OF EXTREME ULTRAVIOLET RADIATION, Laser Focus, June, 1982.Google Scholar
2. Pummer, H., THE STATUS OF COMMERCIAL EXCIMER LASER DEVELOPMENT, Lambda Physik, 289 Great Road, Acton, MA July, 1985.Google Scholar
3. Garrison, B., Srinivasan, R., LASER ABLATION OF ORGANIC POLYMERS: MICROSCOPIC MODELS FOR PHOTOCHEMICAL AND THERMAL PROCESSES, J. Appl. Phys. 57 (8), 15 April, 1985.CrossRefGoogle Scholar
4. Srinivasan, R. and Braren, Bodil, ABLATIVE PHOTODECOMPOSITION OF POLYMER FILMS BY PULSED FARULTRAVIOLET (193NM) LASER RADIATION: DEPENDENCE OF ETCH DEPTH ON EXPERIMENTAL CONDITIONS, Journal of Polymer Science: Polymer Chemistry Edition, Vol. 22, 2601–2609 (1984), John Wiley & Sons, Inc.Google Scholar
5. Ehrlich, D.J., EARLY APPLICATIONS OF LASER DIRECT PATTERNING: DIRECT WRITING AND EXCIMER PROJECTION, Solid State Technology, December, 1985.Google Scholar
6. Polasko, K.J., Elliott, D.J., Piwczyk, B.P., VLSI PATTERN REGISTRATION IMPROVEMENT BY PHOTOABLATION OF RESIST-COVERED ALIGNMENT TARGETS, IEEE Triple Beams Meeting, Woodland Hill, CA, 1987.Google Scholar