Hostname: page-component-586b7cd67f-vdxz6 Total loading time: 0 Render date: 2024-11-25T15:14:24.123Z Has data issue: false hasContentIssue false
  • English
  • Français

Single Crystal Silicon Membranes

Published online by Cambridge University Press:  21 February 2011

Andres Fernandez ,
P. Hren ,
K. C. Lee  and
J. Silcox
Andres Fernandez
Affiliation:
National Nanofabrication Facility and School of Applied and Engineering Physics Cornell University, Ithaca, NY 14853
P. Hren
Affiliation:
National Nanofabrication Facility and School of Applied and Engineering Physics Cornell University, Ithaca, NY 14853
K. C. Lee
Affiliation:
National Nanofabrication Facility and School of Applied and Engineering Physics Cornell University, Ithaca, NY 14853
J. Silcox
Affiliation:
National Nanofabrication Facility and School of Applied and Engineering Physics Cornell University, Ithaca, NY 14853
Get access

Abstract

Self-supporting, thin single crystal membranes can be fabricated from silicon wafers using ion implantation, anodic etching and subsequent annealing. Typically, membranes approximately 1200Å thick and about 250μm in diameter are formed in wafers 4 mil thick. Discs surrounding the membranes can be cut out to provide suitable TEM samples. In this paper, the steps for preparing such samples are presented with as much attention paid to experimental details as possible.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 115: Symposium W – Specimen Preparation for Transmission Electron Microscopy of Materials I , 1987 , 119
Copyright
Copyright © Materials Research Society 1988

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Lee, K. C., Silcox, J. and Lee, C. A., J. Appl. Phys. 54, 4035 (1983).Google Scholar
2. Lee, K. C., Silcox, J. and Lee, C. A., Appl. Phys. Lett. 43(5), 488(1983).Google Scholar
3. Hren, P., Fernandez, A. and Silcox, J., presented at the MRS Fall Meeting, Boston, MA, 1987 (unpublished).Google Scholar
4. Lee, K. C., Ph. D.Thesis, Cornell University, 1987 (unpublished).Google Scholar
5. Cullis, A. G., Seidel, T. E. and Meek, R. L., J. Appl. Phys. 49 (10), 5188 (1978).Google Scholar
6. Mele, T. C., Nulman, J. and Krusius, J. P., J. Vac. Sci. Technol. B 2, 684 (1984).Google Scholar
7. Kaminsky, G., J. Vac. Sci. Technol. B3, 1051 (1985).Google Scholar
8. Tegart, W. J. McG., The Electrolytic and Chemical Polishing of Metals (Pergamon Press, Ltd., London, 1956).Google Scholar
9. Ota, Y., Thin Solid Films 106, 3 (1983).Google Scholar
10. Fernandez, A., National Nanofabrication Facility Technical Report, February 1987 (unpublished).Google Scholar