Hostname: page-component-cd9895bd7-fscjk Total loading time: 0 Render date: 2024-12-27T01:53:58.148Z Has data issue: false hasContentIssue false
  • English
  • Français

Simultaneous Spatially Resolved Multispectral Optical Emission Of Sputter Processes

Published online by Cambridge University Press:  15 February 2011

J. D. Klein  and
S. L. Clauso
J. D. Klein
Affiliation:
EIC Laboratories, Inc., Norwood, MA 02062, [email protected]
S. L. Clauso
Affiliation:
EIC Laboratories, Inc., Norwood, MA 02062, [email protected]
Get access

Abstract

An optical spectroscopy system was configured to monitor several plasma positions at the same time. The system allows monitoring of several points within a single plasma. Magnetron sputtering of YBa2Cu3O7 (YBCO) in a reduction-oxidation (redox) environment provided a process in which both cation and gas species are vital in determining the quality of the product film. Spatial sampling of the sputter plasma defined a disparity in the manner in which Ba and Cu emissions respond to changes in chamber gas composition. Oxygen emissions were found to respond quickly to inlet gas composition while Cu emissions were notably sluggish.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 406: Symposium L – Diagnostic Techniques for Semiconductor Materials Processing , 1995 , 81
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Klein, J. D., Clauson, S. L., and Cogan, S. F., J. Mater. Res. 10, 328 (1995).Google Scholar
2. Klein, J. D., Yen, A., and Clauson, S. L. in Diagnostic Techniques for Semiconductor Materials Processing, edited by Glembocki, O.J., Pang, S.W., Pollak, F.H., Crean, G.M., and Larrabee, G. (Mater. Res. Soc. Proc. 324, Pittsburgh, PA 1994) pp. 347–352.Google Scholar
3. Gavaler, J.R., Talvacchio, J., Braggins, T.T., Forrester, M.G., and Greggi, J., J. Appl. Phys. 70, 4383 (1991).Google Scholar
4. Cukauskas, E.J., Allen, L.H., Sherrill, G.K., and Holm, R.T., Appl. Phys. Lett. 61, 1125 (1992).Google Scholar
5. Krumme, J-P., Hack, R.A.A., and Raaijmakers, I.J.M.M., J. Appl. Phys. 70, 6743 (1991).Google Scholar
6. CRC Handbook of Chemistry and Physics, 59th edition ed. by Weast, R.C. (CRC Press, West Palm Beach, Florida 1978) pp. E–216–342.Google Scholar
7. Gaydon, A.G., The Spectroscopy of Flames (Chapman and Hall, London, 1974), p. 364.Google Scholar
8. Pungor, E. and Cornides, I.in Flame Emission and Atomic Absorption Spectrometry ed. by Dean, J.A. and Rains, T.C., (Marcel Dekker, New York, 1969) p. 49.Google Scholar