Article contents
A Simple Model for Stress Voiding in Passivated Thin Film Conductors
Published online by Cambridge University Press: 15 February 2011
Abstract
A model is proposed for stress voiding in passivated thin film conductors. The rate limiting step is argued to be the formation of vacancies at dislocation jogs which then diffuse to void sites.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 1992
References
REFERENCES
1)
Klema, J., Pyle, R. and Domangue, E., Proc. 22nd Ann. Int'l. Reliab. Phys. Symp., IEEE, 1 (1984)Google Scholar
2)
Curry, J., Fitzgibbon, G., Guan, Y., Muollo, R., Nelson, G. and Thomas, A., 22nd Int'l Reliab. Phys. Symp. IEEE, 6 (1984)Google Scholar
3)
Yue, J.T., Funsten, W.P. and Taylor, R.V., Proc. 23rd Ann. Int'l. Reliab. Phys. Symp. IEEE 4 (1985)Google Scholar
4)
Turner, T. and Wendel, K., Proc. 23rd Ann. Int'l Reliab.Phys. Symp. IEEE, 142 (1985)Google Scholar
5)
Hinode, K., Owada, N., Nishida, T. and Mukai, K., J. Vac. Sci. Technol.
B5, 518 (1987)Google Scholar
7)
Yost, F.G., Romig, A.D. Jr. and Bourcier, R.J., Sandia Report SAND88–0946, Sandia National Laboratories (1988) and F.G. Yost, D.E. Amos and A.D. Romig, Proc. 27th Ann. Int'l. Reliab. Phys. Smp. IEEE, 193 (1989)Google Scholar
10
Kaneko, H., Hasanuma, M., Sawabe, A., Kawanoue, T., Kohanawa, Y., Komatsu, S. and Miyachi, M., Proc. 28th Ann. Int'l Reliab. Phys. Symp. IEEE, 194 (1990)Google Scholar
11)
Tanikawa, A., Okabayashi, H., Morii, H. and Fujita, H., Proc. 28th Ann. Int'l. Reliab. Phys. Symp., 209 (1990)Google Scholar
- 6
- Cited by