Hostname: page-component-586b7cd67f-2brh9 Total loading time: 0 Render date: 2024-11-25T15:17:05.615Z Has data issue: false hasContentIssue false
  • English
  • Français

Simple and Effective Way to Improve the Stability of Titanium Based Boron Doped Diamond Film Electrode

Published online by Cambridge University Press:  01 February 2011

Liang Guo  and
Guohua Chen
Liang Guo
Affiliation:
Hong Kong University of Science and Technology, Chemical Engineering, Clear Water Bay, Kowloon, 000000, Hong Kong, 852-23587138, 852-23580054
Guohua Chen
Affiliation:
[email protected], Hong Kong University of Science and Technology, Department of Chemical Engineering, Clear Water Bay, Kowloon, Hong Kong, China, People's Republic of
Get access

Abstract

Boron-doped diamond film coated titanium (Ti/BDD) becomes increasingly attractive because of the combined properties of these two unique materials. The challenge for the composite material is the stability especially when it is used as an electrode. In order to meet this challenge, two temperature (2-temp) staged hot filament chemical vapor deposition method was employed in this study. The accelerated working life time was significantly increased to 804 hours for the 2-temp electrode, compared with 244 hours for the diamond film electrode fabricated under one temperature (1-temp) stage method. With the characterization of micro-Raman, XRD, and cross-sectional SEM, a multilayer of Ti/TiC/(Diamond+Amorphous Carbon)/Diamond can be found in the 2-temp sample and the structure of Ti/TiC/Diamond in the 1-temp sample. There was less void space observed in the interlayer of 2-temp sample. The multi-layered compact structure plays an important role in improving the adhesion of diamond film to the titanium substrate which in turn increases the electrode working life time by over 3 times.

Keywords

chemical vapor deposition (CVD) (deposition)diamondTi
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 956: Symposium J – Diamond Electronics—Fundamentals to Applications , 2006 , 0956-J15-05
Copyright
Copyright © Materials Research Society 2007

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Chen, X., Chen, G., Gao, F., Yue, P. L., Environ. Sci. Technol. 37(2003) 5021.Google Scholar
2. Chen, X., Chen, G., Yue, P. L., Chem. Eng. Sci. 58(2003) 995.Google Scholar
3. Diniz, A. V., Ferreira, N. G., Corat, E. J., Trava-Airoldi, V. J., Diamond Relat. Mater. 12(2003) 577.Google Scholar
4. Fu, Y., Du, H., Sun, C. Q., Thin Solid Films. 424(2003) 107.Google Scholar
5. Ager, J. W., Drory, M. D., Phys. Review B. 48(1993) 2601.Google Scholar
6. Park, S., Lee, J., J. Appl. Phys. 69(1991) 2618.Google Scholar
7. Chen, Q., Lin, Z., J. Mater. Res. 10(1995) 2685.Google Scholar
8. Guo, L., Chen, G., High-quality Diamond Film Deposition on Titanium Substrate using Hot- Filament Chemical Vapor Deposition Method, Diamond Relat. Mate., 2006, accepted.Google Scholar
9. Knight, D. S., White, W. B., J. Mater. Res. 4(1989) 385.Google Scholar
10. Duo, I., Levy-Clement, C., Fujishima, A., Comninellis, C., J. Appl. Electrochem., 34(2004) 935.Google Scholar
11. Ramesham, R., Thin Solid Films, 339(1999) 82.Google Scholar