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Silicon Thin-Films from Nanoparticle dispersion: Tailoring Morphological, Electrical and Optical Characteristics.

Published online by Cambridge University Press:  12 July 2011

Etienne Drahi ,
Sylvain Blayac  and
Patrick Benaben
Etienne Drahi
Affiliation:
Centre Microélectronique de Provence – Georges Charpak, Ecole Nationale Supérieure des Mines de Saint Etienne, 13541 Gardanne, France
Sylvain Blayac
Affiliation:
Centre Microélectronique de Provence – Georges Charpak, Ecole Nationale Supérieure des Mines de Saint Etienne, 13541 Gardanne, France
Patrick Benaben
Affiliation:
Centre Microélectronique de Provence – Georges Charpak, Ecole Nationale Supérieure des Mines de Saint Etienne, 13541 Gardanne, France
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Abstract

Amorphous and microcrystalline silicon are currently used for electronic devices such as solar cells and thin-film transistors. This paper shows that silicon nanoparticle dispersion has the potential to be used as source material for polycrystalline silicon thin-film thus opening a route to solution processed silicon devices. After deposition, a classical thermal or microwave annealing step is used to induce the coalescence of the silicon nanoparticles. Both sintering techniques are studied in terms of morphology, electrical and optical properties.

Keywords

photovoltaicsinteringmicrowave heating
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1321: Symposium A – Amorphous and Polycrystalline Thin-Film Silicon Science and Technology , 2011 , mrss11-1321-a12-03
Copyright
Copyright © Materials Research Society 2011

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References

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