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Silicon Nitride Synthesis by Laser Pyrolysis of an Aerosol-Dispersed Precursor

Published online by Cambridge University Press:  21 February 2011

Tongsan D. Xiao
Affiliation:
The University of Connecticut, Institute of Materials Science and Department of Metallurgy, U-136, Storrs, CT 06268.
Peter R. Strutt
Affiliation:
The University of Connecticut, Institute of Materials Science and Department of Metallurgy, U-136, Storrs, CT 06268.
Kenneth E. Gonsalves
Affiliation:
Stevens Institute of Technology, Department of Chemistry and Chemical Engineering, Hoboken, NJ 07030.
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Abstract

Surface layers of ultrafine Si3N4 particles (30–100 nm. diameter) have been synthesized by laser-pyrolysis of a liquid precursor, dispersed as an aerosol. This aerosol was formed in a nitrogen environment (at near ambient pressure) using an ultrasonically activated nozzle. The organosilazane precursor, which was specially designed for CO2 laser pyrolysis, was of the type (CH3SiHNH)x, with x = 3 or 4. In the current experiments deposition was performed on Ni substrates using a (i) 7 cm/s. substrate translational velocity, and (ii) ˜2.8 × 102 w/cm2 power density.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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