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Silica/Silicone Nanocomposite Films: A New Concept in Corrosion Protection

Published online by Cambridge University Press:  15 February 2011

Theresa E. Gentle
Affiliation:
Dow Corning Corp., Midland, MI. 48686
Ronald H. Baney
Affiliation:
Dow Corning Corp., Midland, MI. 48686
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Abstract

Thin films of silsesquioxane, (HSiO3/2)n, were applied to aluminum panels and to CMOS microelectronic circuit surfaces by spin or dip coating organic solutions of the silsesquioxane. Nanoporous silica was obtained by oxidation of the silsesquioxane. These nanoporous silica films were then vacuum infiltrated with various viscosities of polydimethylsiloxanes (PDMS) to form hydrophobic nanocomposites. The nanocomposite films were shown to provide superior hermetic protection against salt fog exposure when compared to PDMS and silica films alone.

The composite films were characterized by FTIR and optical microscopy. FTIR spectra showed that the silica served as a skeletal framework holding the hydrophobic PDMS in place and preventing loss of adhesion. This is in contrast to PDMS films alone in which blistering of the film from the substrate can occur, thus, allowing ions and moisture to reach the surface and corrosion to take place.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

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