Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Wang, J. J.
Lambers, E. S.
Pearton, S. J.
Ostling, M.
Zetterling, C.-M.
Grow, J. M.
and
Ren, F.
1997.
Icp Etching Of SiC.
MRS Proceedings,
Vol. 483,
Issue. ,
Maruska, H. Paul
Lioubtchenko, Mike
Tetreault, Thomas G.
Osinskif, Marek
Pearton, Stephen J.
Schurmant, Matthew
Vaudo, Robert
Sakap, Shiro
Chen, Qisheng
and
Shult, Randy J.
1997.
Introduction Of Ions Into Wide Band Gap Semiconductors.
MRS Proceedings,
Vol. 483,
Issue. ,
Peters, D.
Schörner, R.
Hölzlein, K.-H.
and
Friedrichs, P.
1997.
Planar aluminum-implanted 1400 V 4H silicon carbide p-n diodes with low on resistance.
Applied Physics Letters,
Vol. 71,
Issue. 20,
p.
2996.
Dwight, Deborah
Rao, Mulpuri V.
Holland, O. W.
Kelner, G.
Chi, P. H.
Kretchmer, J.
and
Ghezzo, M.
1997.
Nitrogen and aluminum implantation in high resistivity silicon carbide.
Journal of Applied Physics,
Vol. 82,
Issue. 11,
p.
5327.
Sadeghi, M.
Jauhiainen, A.
Liss, B.
Sveinbjörnsson, E. Ö.
and
Engström, O.
1997.
High Frequency Capacitance Measurements On Metal-Insulator-Semiconductor Structures In Thermal Non-Equilibrium Condition.
MRS Proceedings,
Vol. 483,
Issue. ,
Sadeghi, M.
Jauhiainen, A.
Liss, B.
Sveinbjörnsson, E.Ö.
and
Engström, O.
1998.
High frequency capacitance measurements on metal–insulator–semiconductor structures in thermal non-equilibrium condition.
Solid-State Electronics,
Vol. 42,
Issue. 12,
p.
2233.
Wee, A.T.S
Li, K
and
Tin, C.C
1998.
Surface chemical states on LPCVD-grown 4H-SiC epilayers.
Applied Surface Science,
Vol. 126,
Issue. 1-2,
p.
34.
Wang, J. J.
Lambers, E. S.
Pearton, S. J.
Ostling, M.
Zetterling, C.-M.
Grow, J. M.
Ren, F.
and
Shul, R. J.
1998.
Inductively coupled plasma etching of bulk 6H-SiC and thin-film SiCN in NF3 chemistries.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films,
Vol. 16,
Issue. 4,
p.
2204.
Wang, J.J
Lambers, E.S
Pearton, S.J
Ostling, M
Zetterling, C.-M
Grow, J.M
Ren, F
and
Shul, R.J
1998.
ICP etching of SiC.
Solid-State Electronics,
Vol. 42,
Issue. 12,
p.
2283.
Kakanakova-Georgieva, A
Kassamakova, L
Marinova, Ts
Kakanakov, R
Noblanc, O
Arnodo, C
Cassette, S
and
Brylinski, C
1999.
Interface chemistry of WN/4H–SiC structures.
Applied Surface Science,
Vol. 151,
Issue. 3-4,
p.
225.
Rao, Mulpuri V.
Tucker, Jesse B.
Ridgway, M. C.
Holland, O. W.
Papanicolaou, N.
and
Mittereder, J.
1999.
Ion-implantation in bulk semi-insulating 4H–SiC.
Journal of Applied Physics,
Vol. 86,
Issue. 2,
p.
752.
Elasser, A.
Kheraluwala, M.
Ghezzo, M.
Steigerwald, R.
Krishnamurthy, N.
Kretchmer, J.
and
Chow, T.P.
1999.
A comparative evaluation of new silicon carbide diodes and state-of-the-art silicon diodes for power electronic applications.
Vol. 1,
Issue. ,
p.
341.
Grisolia, J
de Mauduit, B
Gimbert, J
Billon, Th
Ben Assayag, G
Bourgerette, C
and
Claverie, A
1999.
TEM studies of the defects introduced by ion implantation in SiC.
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms,
Vol. 147,
Issue. 1-4,
p.
62.
Oskam, G.
Searson, P. C.
and
Cole, M. W.
2000.
Fabrication of n-type 4H–SiC/Ni junctions using electrochemical deposition.
Applied Physics Letters,
Vol. 76,
Issue. 10,
p.
1300.
Cole, M. W.
Joshi, P. C.
Hubbard, C. W.
Wood, M. C.
Ervin, M. H.
Geil, B.
and
Ren, F.
2000.
Improved Ni based composite Ohmic contact to n-SiC for high temperature and high power device applications.
Journal of Applied Physics,
Vol. 88,
Issue. 5,
p.
2652.
Elasser, A.
Ghezzo, M.
Krishnamurthy, N.
Kretchmer, J.
Clock, A.W.
Brown, D.M.
and
Chow, T.P.
2000.
Switching characteristics of silicon carbide power PiN diodes.
Solid-State Electronics,
Vol. 44,
Issue. 2,
p.
317.
Ha, Seoyong
Nuhfer, Noel T.
Rohrer, Gregory S.
de Graef, Marc
and
Skowronski, Marek
2000.
Identification of prismatic slip bands in 4H SiC boules grown by physical vapor transport.
Journal of Electronic Materials,
Vol. 29,
Issue. 7,
p.
L5.
Ha, Seoyong
Nuhfer, Noel T
Rohrer, Gregory S
De Graef, Marc
and
Skowronski, Marek
2000.
Origin of domain structure in hexagonal silicon carbide boules grown by the physical vapor transport method.
Journal of Crystal Growth,
Vol. 220,
Issue. 3,
p.
308.
Cole, M. W.
Joshi, P. C.
Ren, F.
Hubbard, C. W.
Wood, M. C.
and
Ervin, M. H.
2000.
The Materials Properties of a Nickel Based Composite Contact to n-Sic for Pulsed Power Switching.
MRS Proceedings,
Vol. 622,
Issue. ,
Kuhr, Thomas A.
Sanchez, Edward K.
Skowronski, Marek
Vetter, William M.
and
Dudley, Michael
2001.
Hexagonal voids and the formation of micropipes during SiC sublimation growth.
Journal of Applied Physics,
Vol. 89,
Issue. 8,
p.
4625.