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β-SiC MESFETs*

Published online by Cambridge University Press:  25 February 2011

G. Kelner
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5000
S. Binari
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5000
K. Sleger
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5000
H. Kong
Affiliation:
North Carolina State University, Raleigh, N.C. 27695-7907
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Abstract

A β-SiC MESFET structure with functional DC characteristics has been fabricated and evaluated. The MESFET employs an epitaxial n on p SiC layer grown by chemical vapor deposition on a p-type Si(100) substrate. Modulation of the n-type channel current is achieved with a Au Schottky barrier gate. A transconductance of 2.3 mS/mm was obtained using a 5 micron gate length.

Type
Research Article
Copyright
Copyright © Materials Research Society 1987

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Footnotes

*

This work was sponsored by the Office of Naval Research

References

REFERENCES

1. Ferry, D.K., “High field transport in wide-bandgap semiconductors,” Phys. Rev., Vol. B12, pp. 23612369, 1975.Google Scholar
2. Opdorp, C. van and Vrakking, J., “Avalanche breakdown in epitaxial SiC p-n junctions,” J. Appl. Phys., Vol.40, pp. 23202322, 1969.Google Scholar
3. Verma, A.R. and Krishna, P., Polymorphism and polytypism in crystals, New York: John Wiley & Sons, 1966.Google Scholar
4. Muench, W.V., Hoeck, P. and Pettenpoul, E., “Silicon carbide field-effect and bipolar transistors,” IEDM, pp. 337–339, 1977.Google Scholar
5. Sasaki, K., Sakuma, E., Misawa, S., Yoshida, S., and Gonda, S., “High temperature electrical properties of 3C-SiC epitaxial layers grown by chemical vapor deposition,” Appl. Phys. Lett., V45, pp. 7273, 1984.Google Scholar
6. Liaw, P. and Davis, R.F., “Epitaxial growth and characterization of β-SiC thin films,” J. Electrochem. Soc., Vol.132, pp. 642648, 1985.Google Scholar
7. Nishino, S., Powell, J.A., and Will, H.A., “Production of large area single crystal wafers of cubic SiC for semiconductor devices,” Appl. Phys. Lett., Vol.42, pp. 460462, 1983.Google Scholar
8. Shibahara, K., Saito, T., Nishino, S. and Matsunami, H., “Inversion-type n-channel MOSFET using antiphase-domain free cubic-SiC grown on Si (100),” Extended Abstracts 18th (1986 International) Conference on Solid State Devices and Materials, Tokyo, pp. 717–718, 1986.Google Scholar
9. Furukawa, K., Hatano, A., Uemoto, A., Fujii, Y., Nakanishi, K., Shigeta, M., Suzuki, Akira, and Nakajima, S., “Insulated-Gate and Junction-Gate FET's of CVD-grown β-SiC,” IEEE Electron Device Letters, Vol.8, pp. 4849, 1987.Google Scholar
10. Yoshida, S., Daimon, H., Yamanaka, M., Sakuma, E., Misawa, S. and Endo, E., “Schottky barrier field-effect transistors of 3C-SiC,” J. Appl. Phys., Vol.60, pp. 29892990, 1986.Google Scholar
11. Kelner, G., Binari, S.C., Sleger, K., and Kong, H., “β-SiC Schottky-Barrier FETs,” Third National Review meeting on Growth and Characterization of SiC, NCSU, Raleigh, N.C., November 1986.Google Scholar
12. Kelner, G., Binari, S.C., Klein, P.H., “Plasma etching of β-SiC,” J. Electrochem. Soc., Vol.134, pp. 253254, 1987.Google Scholar
13. Vergnolle, Claude, Funk, R. and Laviron, M., “An Adequate Structure for Power Microwave FETs,” IEEE International Solid-State Circuits Conf., pp. 66–67, 1975.Google Scholar