Article contents
Sequential Stretching Lithography
Published online by Cambridge University Press: 01 February 2011
Abstract
We developed an embossing/imprinting based nanofabrication technique, dubbed Sequential Stretching Lithography (SSL). In this process, a master pattern is imprinted into an elastomer containing a film of uncured elastomer. The elastomer is cured and then elongated to increase feature density and reduce feature size. Replication of this substrate yields a new master that can be used in further reduction steps. One-dimensional grating features with a pitch size below 200 nm were fabricated from 750 nm-pitch grating lines. This process gives us a faithful pattern miniaturization in all aspects and, as a result, a much effective control on density and dimension regulation.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 2007
References
REFERENCES
- 1
- Cited by