Hostname: page-component-586b7cd67f-rdxmf Total loading time: 0 Render date: 2024-11-27T00:44:13.676Z Has data issue: false hasContentIssue false
  • English
  • Français

Self-Assembled 3-Mercaptopropyltrimethoxysilane (MPS) ON Ba0.5Sr0.5TiO3 as an Adhesion Layer for Microwave Devices

Published online by Cambridge University Press:  21 March 2011

Carlos R. Cabrera ,
Joseph D. Warner ,
Carl H. Mueller ,
Fred Van Keuls ,
Félix A. Miranda ,
Rolando Tremont ,
Daniel Blasini  and
Angel Morales
Carlos R. Cabrera
Affiliation:
NASA-Glenn Research Center, 21000 Brookpark Road, Cleveland, Ohio 44135 Department of Chemistry, P.O. Box 23346, University of Puerto Rico at Río Piedras, San Juan, Puerto Rico 00931-3346. NASA Administrator's Fellow
Joseph D. Warner
Affiliation:
NASA-Glenn Research Center, 21000 Brookpark Road, Cleveland, Ohio 44135
Carl H. Mueller
Affiliation:
NASA-Glenn Research Center, 21000 Brookpark Road, Cleveland, Ohio 44135
Fred Van Keuls
Affiliation:
NASA-Glenn Research Center, 21000 Brookpark Road, Cleveland, Ohio 44135
Félix A. Miranda
Affiliation:
NASA-Glenn Research Center, 21000 Brookpark Road, Cleveland, Ohio 44135
Rolando Tremont
Affiliation:
Department of Chemistry, P.O. Box 23346, University of Puerto Rico at Río Piedras, San Juan, Puerto Rico 00931-3346.
Daniel Blasini
Affiliation:
Department of Chemistry, P.O. Box 23346, University of Puerto Rico at Río Piedras, San Juan, Puerto Rico 00931-3346.
Angel Morales
Affiliation:
Department of Chemistry, P.O. Box 23346, University of Puerto Rico at Río Piedras, San Juan, Puerto Rico 00931-3346.
Get access

Abstract

The use of self-assembled monolayers in patterning, adhesion studies, corrosion protection, and electronic devices is a growing research field. Here we discuss the use of (3-mercaptopropyl)trimethoxysilane (MPS) as an adhesion layer in microwave components using metal-ferroelectric thin film-dielectric heterostructures. The MPS has been used as an adhesion layer between a ferroelectric thin film and gold (Au) in the development of tunable microwave components. The system studied was the metal/ferroelectric thin film/dielectric heterostructure with the MPS molecule as an adhesion layer between the metal and the ferroelectric thin film. Specifically, we have looked at the interface between the Au layer and the Ba0.5Sr0.5TiO3 (BSTO) ferroelectric thin film deposited on LaAlO3 (LAO). Typically, during metallization via e-beam evaporation, it is common to deposit a chrome or titanium adhesion layer (∼ 15 nm thick) between the Au and BSTO films. However, this underlayer may diffuse through the Au causing an increase of the RF losses of the device. Replacing the metal buffer layer interface with a self-assembled structure, such as MPS, can avoid the effect of inter- diffusion of chrome in the Au vapor deposit film. The surface modification of Ba0.5Sr0.5TiO3 (BSTO) thin film with MPS was studied by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy. The effectiveness of MPS self-assembled monolayers as an adhesion layer was determined by analyzing the performance of Au/MPS/BSTO/LAO interdigital capacitors as a function of dc voltage and temperature at 1 MHz.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 666: Symposium F – Transport and Microstructural Phenomena , 2001 , F9.1
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Wasserman, S.R., Biebuyck, H., Whitesides, G.M. J. Mater. Res. 1989, 4, 886.Google Scholar
2 Sagiv, J., J. Am. Chem. Soc. 1980, 102, 92.Google Scholar
3 Ulman, A. MRS Bulletin 1995, 20(June).Google Scholar
4 Nuzzo, R.G., Allara, D.L. J. Am. Chem. Soc. 1983, 105, 4481.Google Scholar
5 Thompson, W.R., Pemberton, J.E. Chem. Mater. 1995, 7, 130.Google Scholar
6 Goss, C.A., Charych, D.H., Majda, M Anal. Chem. 1991, 63, 85.Google Scholar
7 Mosier-Boss, P.A., Lieberman, S.H., Applied Spectroscopy 1999, 53, 862.Google Scholar
8 Gevorgian, S., Carlsson, E., Rudner, S., Wernlund, L.-D., Wang, X., and Helwersson, U., IEEE Proc. Microw. Antennas Propag. 1996, 143, 397.Google Scholar