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Selective Surface Modification of Fluorocarbon Resin Using Excimer Laser

Published online by Cambridge University Press:  21 February 2011

M. Okoshi ,
M. Murahara  and
K. Toyoda
M. Okoshi
Affiliation:
Graduate Student of Faculty Eng., Tokai University
M. Murahara
Affiliation:
Faculty of Engineering, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa, 259-12, Japan
K. Toyoda
Affiliation:
RIKEN, The Institute of Physical and Chemical Research, 2-1 Hirokawa, Wako, Saitama, 351-01, Japan
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Abstract

The fluorocarbon resin (Teflon) which is a very stable material chemically, has chemical resistance. Because of this property, it has no affinity for oil or water. Therefore, we have tried selective area modification of the resin surface b-y using an excimer laser.

Fluorocarbon resin is a polymer of C-F bonds. In our experiment, the resin surface was irradiated by an ArF excimer laser, of which the photon energy is higher than that of the C-F bond, to excite the strong C-F bonds. B radicals, the best combination for F atoms, were formed simultaneously. Consequently, F atoms of C-F bonds were pulled out by B radicals. B(CH3 )3 with absorption in agreement with the wavelength of the ArF laser were used as raw materials of the B radicals. By irradiating the gas by the ArF laser beam, the photodecomposed B radicals functioned by pulling out F atoms, and the other methyl radicals ( -CH3 ) substituted for F atoms. As the result, this resin surface turned out to be oleophilic exclusively on the areas exposed to the light.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 158: Symposium B – In-Situ Patterning: Selective Area Deposition and Etching , 1989 , 33
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

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